Electrical properties of metamorphic In0.52Al0.48As/In0.65Ga0.35As HEMT's on GaAs substrate

Author(s):  
Z.J. Qiu ◽  
R. Liu ◽  
S.L. Zhang ◽  
Y.S. Gui ◽  
L.J. Cui ◽  
...  
2020 ◽  
Vol 504 ◽  
pp. 144315 ◽  
Author(s):  
Dler Adil Jameel ◽  
John Fredy Ricardo Marroquin ◽  
Mohsin Aziz ◽  
Noor Alhuda Al Saqri ◽  
Inshad Jum'h ◽  
...  

2010 ◽  
Author(s):  
Y. H. Zhang ◽  
P. P. Chen ◽  
T. Lin ◽  
H. Xia ◽  
T. X. Li

1993 ◽  
Vol 62 (23) ◽  
pp. 2995-2997 ◽  
Author(s):  
X. W. Lin ◽  
A. Piotrowska ◽  
E. Kaminska ◽  
Z. Liliental‐Weber ◽  
J. Washburn ◽  
...  

2014 ◽  
Vol 875-877 ◽  
pp. 394-398
Author(s):  
Wen Li Chen ◽  
Xia Zhang ◽  
Xin Yan ◽  
Jun Shuai Li ◽  
Yong Qing Huang ◽  
...  

We theoretically analyze the electrical properties of GaAs substrate-nanowire p-n junction using Technology Computer Aided Design (TCAD). The results show that GaAs nanowire-substrate p-n junction exhibits clear diode behavior which has been confirmed in some experiments. Increasing NWs doping concentration and diameter or shortening NWs length can enlarge the total current after the diode is conducted. Total current through p-n junction is approximately linearly proportional to NWs growth density. The substrate-nanowires p-n junction has smaller current than that of substrate-layer p-n junction, which implies the superiority of NW structure. These results constitute an important progress for experimental researches on nanowire-integrated devices.


1996 ◽  
Vol 25 (2) ◽  
pp. 245-251 ◽  
Author(s):  
Takayuki Sawada ◽  
Yuji Yamagata ◽  
Kazuaki Imai ◽  
Kazuhiko Suzuki

1964 ◽  
Vol 35 (10) ◽  
pp. 2959-2962 ◽  
Author(s):  
Herbert Flicker ◽  
Bernard Goldstein ◽  
Paul‐Andre Hoss

2008 ◽  
Vol 103 (7) ◽  
pp. 074102 ◽  
Author(s):  
Chao-Ching Cheng ◽  
Chao-Hsin Chien ◽  
Guang-Li Luo ◽  
Chun-Hui Yang ◽  
Ching-Chih Chang ◽  
...  

2002 ◽  
Vol 46 (8) ◽  
pp. 1103-1108 ◽  
Author(s):  
R.H Horng ◽  
W.C Peng ◽  
D.S Wuu ◽  
W.J Ho ◽  
Y.S Huang

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