3D Wafer Level Packaging Approach Towards Cost Effective Low Loss High Density 3D Stacking

2006 ◽  
Author(s):  
Philip Pieters ◽  
Eric Beyne
Keyword(s):  
Cost Effective ◽  
High Density ◽  
Wafer Level ◽  
Low Loss ◽  
Wafer Level Packaging ◽  
3D Stacking

Through Silicon Via Technology: Cost effective Cu-TSV Interconnects by EMC3D and Technical Challenges with Cu-TSV

2010 ◽  
Vol 2010 (DPC) ◽  
pp. 000425-000445
Author(s):  
Paul Siblerud ◽  
Rozalia Beica ◽  
Bioh Kim ◽  
Erik Young
Keyword(s):  
Low Cost ◽  
Cost Effective ◽  
High Yield ◽  
Integrated Process ◽  
Wafer Level ◽  
Through Silicon Via ◽  
Wafer Level Packaging ◽  
Current State ◽  
Future Technologies ◽  
Ic Technology

The development of IC technology is driven by the need to increase performance and functionality while reducing size, power and cost. The continuous pressure to meet those requirements has created innovative, small, cost-effective 3-D packaging technologies. 3-D packaging can offer significant advantages in performance, functionality and form factor for future technologies. Breakthrough in wafer level packaging using through silicon via technology has proven to be technologically beneficial. Integration of several key and challenging process steps with a high yield and low cost is key to the general adoption of the technology. This paper will outline the breakthroughs in cost associated with an iTSV or Via-Mid structure in a integrated process flow. Key process technologies enabling 3-D chip:Via formationInsulator, barrier and seed depositionCopper filling (plating),CMPWafer thinningDie to Wafer/chip alignment, bonding and dicing This presentation will investigate these techniques that require interdisciplinary coordination and integration that previously have not been practiced. We will review the current state of 3-D interconnects and the of a cost effective Via-first TSV integrated process.

Cost Comparison of Fan-out Wafer Level Packaging and Flip Chip Packaging

2017 ◽  
Vol 2017 (DPC) ◽  
pp. 1-37 ◽  
Author(s):  
Amy Lujan
Keyword(s):  
Flip Chip ◽  
Cost Effective ◽  
Cost Comparison ◽  
Cost Modeling ◽  
Wafer Level ◽  
Design Features ◽  
Wafer Level Packaging ◽  
Flip Chip Packaging ◽  
The Right ◽  
The Cost

In recent years, there has been increased focus on fan-out wafer level packaging with the growing inclusion of a variety of fan-out wafer level packages in mobile products. While fan-out wafer level packaging may be the right solution for many designs, it is not always the lowest cost solution. The right packaging choice is the packaging technology that meets design requirements at the lowest cost. Flip chip packaging, a more mature technology, continues to be an alternative to fan-out wafer level packaging. It is important for many in the electronic packaging industry to be able to determine whether flip chip or fan-out wafer level packaging is the most cost-effective option. This paper will compare the cost of flip chip and fan-out wafer level packaging across a variety of designs. Additionally, the process flows for each technology will be introduced and the cost drivers highlighted. A variety of package sizes, die sizes, and design features will be covered by the cost comparison. Yield is a key component of cost and will also be considered in the analysis. Activity based cost modeling will be used for this analysis. With this type of cost modeling, a process flow is divided into a series of activities, and the total cost of each activity is accumulated. The cost of each activity is determined by analyzing the following attributes: time required, labor required, material required (consumable and permanent), capital required, and yield loss. The goal of this cost comparison is to determine which design features drive a design to be packaged more cost-effectively as a flip chip package, and which design features result in a lower cost fan-out wafer level package.

Cost-Effective Precision 3D Glass Microfabrication for Advanced Packaging Applications

2012 ◽  
Vol 2012 (DPC) ◽  
pp. 000791-000810
Author(s):  
Jeb Flemming ◽  
Roger Cook ◽  
Kevin Dunn ◽  
James Gouker
Keyword(s):  
Cost Effective ◽  
High Density ◽  
Consumer Electronics ◽  
Liquid Crystal Polymers ◽  
Portable Devices ◽  
Signal Loss ◽  
Wafer Level ◽  
Advanced Packaging ◽  
And Performance ◽  
Optical Waveguiding

Today's packaging has become the limiting element in system cost and performance for IC development. Assembly and packaging technologies have become primary differentiators for manufactures of consumer electronics and the main enabler of small IC product development. Traditional packaging approaches to address the needs in these “High Density Portable” devices, including FR4, liquid crystal polymers, and Low Temperature Co-Fire Ceramics, are running into fundamental limits in packaging layer thinness, high density interconnects (HDI) size and density, and do not present solutions to in-package thermal management, and optical waveguiding. In this talk, 3D Glass Solutions will present on our efforts to create advanced microelectronic packing solutions using our APEX™ Glass ceramic which offers a single material capable of being simultaneously used for ultra-HDI through glass vias (TGVs), optical waveguiding, and in-package microfluidic cooling. In this talk we will discuss our latest results in wafer-level microfabrication of packaging solutions. We will present on our efforts for creating copper filled vias, surface metallization, and passivation. Furthermore, we will present our efforts in exploring this material to produce (1) ultra-HDI glass interposers, with TGVs as small as 12 microns, with 14 micron center –to-center, (2) advanced RF packages with unique surface architectures designed to minimize signal loss, and (3) creating wave guiding structures in HDI packages.

A Low-Loss and High-Isolation Transformer-Based mm-Wave SPDT with Integrated Fan-out Wafer Level Packaging

2019 ◽  
Vol 29 (07) ◽  
pp. 2050115
Author(s):  
Xing Quan ◽  
Jiang Luo ◽  
Guodong Su ◽  
Kai Jing ◽  
Jinsong Zhan
Keyword(s):  
Design Method ◽  
Control Device ◽  
Secondary Coil ◽  
Cmos Process ◽  
Wafer Level ◽  
Low Loss ◽  
High Isolation ◽  
Wafer Level Packaging ◽  
Isolation Transformer ◽  
Better Than

This paper proposes a low-loss and high-isolation transformer (TF)-based mm-wave single-pole double-throw (SPDT) switch. The center-tapped technique is employed at the secondary coil of TF to improve isolation performance. The TF is implemented with the metals in redistribution layers (RDLs) in integrated fan-out (InFO) wafer level packaging technology to obtain low insertion loss (IL) and small chip size as the TF usually dominates the area of SPDT. The control device of the SPDT is realized in 40[Formula: see text]nm bulk CMOS process. The simulated result shows the proposed SPDT achieves a minimum IL of 1.34[Formula: see text]dB and the IL is less than 2.2[Formula: see text]dB at 24–31[Formula: see text]GHz. The isolations are better than 27[Formula: see text]dB between two double-throw ports and better than 20[Formula: see text]dB between single-pole and double-throw ports, respectively. The proposed SPDT has a compact silicon size of 220[Formula: see text][Formula: see text] (with PADs) and its return losses are better than [Formula: see text]9[Formula: see text]dB at 24–31[Formula: see text]GHz and. This work explores a new chip-package co-design method for the SPDT and may have some guidance for the co-design of SPDT and antenna in package (AiP).

3D system-in-package design using stacked silicon submount technology

2015 ◽  
Vol 32 (2) ◽  
pp. 63-72 ◽  
Author(s):  
Mingzhi Dong ◽  
Fabio Santagata ◽  
Robert Sokolovskij ◽  
Jia Wei ◽  
Cadmus Yuan ◽  
...  
Keyword(s):  
Cost Effective ◽  
Micro Electro Mechanical System ◽  
Wafer Level ◽  
Content Type ◽  
Package Design ◽  
Smart Lighting ◽  
Passive Devices ◽  
New Process ◽  
3D Stacking ◽  
The Cost

Purpose – This study aims to provide a flexible and cost-effective solution of 3D heterogeneous integration for applications such as micro-electro-mechanical system (MEMS) applications and smart sensor systems. Design/methodology/approach – A novel 3D system-in-package (SiP) based on stacked silicon submount technology was successfully developed and well-demonstrated by the fabrication and assembly process of a selected smart lighting module. Findings – The stacked module consists of multiple layers of silicon submounts which can be designed and fabricated in parallel. The bonding and interconnecting process is quite simple and does not require complicated equipment. The 3D stacking design offers higher silicon efficiency and miniaturized package form factor. The submount wafer can be assembled and tested at the wafer level, thus reducing the cost and improving the yield. Research limitations/implications – The embedding design presented in this paper is applicable for modules with limited number of passives. When it comes to cases with more passive devices, new process needs to be developed to achieve fast, inexpensive and reliable assembly. Originality/value – The presented 3D SiP design is novel for applications such as smart lighting, Internet of Things, MEMS systems, etc.

High-density interconnect board design for wafer-level packaging

2011 ◽  
Vol 47 (20) ◽  
pp. 1137 ◽  
Author(s):  
B. Wu ◽  
B. Brown ◽  
E. Warner
Keyword(s):  
High Density ◽  
Wafer Level ◽  
Wafer Level Packaging

Embedded Si Fan Out: A Low Cost Wafer Level Packaging Technology Without Molding and De-bonding Processes

2017 ◽  
Vol 2017 (DPC) ◽  
pp. 1-15
Author(s):  
Hong Xie ◽  
Daquan Yu ◽  
Zhenrui Huang ◽  
Zhiyi Xiao ◽  
Li Yang ◽  
...  
Keyword(s):  
Form Factor ◽  
High Speed ◽  
Low Cost ◽  
High Density ◽  
Wafer Level ◽  
Small Form ◽  
Wafer Level Packaging ◽  
Temporary Bonding ◽  
Small Form Factor ◽  
Si Wafer

The growing and diversifying system requirements have continued to drive the development of a variety of new package technologies and configurations: small form factor, low weight, low profile, high pin count and high speed and low cost. Embedded chip in EMC, also called fan-out wafer-level packaging (FOWLP), has been used in various products such as baseband, RF (radio frequency) transceiver, and PMICs (power management ICs). Currently, INFO technology developed by TSMC®, NANIUM® were in mass production for 3D integration for processor and memory, which inspires other packaging foundries to develop their own embedded FOWLP for the forecasted explosive growth of this market in the next few years. There are a number of challenges for FOWLP. For process point of view, temporary bonding and de-bonding are required. EMC wafers are difficult to handle due to its large warpage driven by the big CTE difference between the Si and molding material. In addition, the manufacturing of fine pitch RDL on EMC surface is also difficult. In this paper, the concept of wafer level embedded Si Fan-Out (eSiFO) technology was introduced and the development progress was reported. For eSiFO, cavities with certain depth were formed by Si dry etch. Then device dies were thinned to designed thickness. The dice were then placed into the cavities and bonded by the attached film on the bottom of the dice. A reconstructed wafer was formed. The micro gap between the chip and sidewall of the cavity as well as the surface of the reconstructed wafer were filled by dry film using vacuum process. Next, the pads were opened, followed RDL fabrication, repassivation, BGA, wafer thinning and dicing. Finally, an eSiFO package was fabricated. There are a number of advantages for eSiFO technology. There is nearly no warpage since the Si was used as reconstruct substrate. The process is relatively simple since no molding, temporary bonding and de-bonding are required. RDL manufacturing is easier on Si wafer vs with molding compounds and can achieve high density routing. Furthermore, it can provide small form factor since the thinning of wafer is the last step. To prove the concept of eSiFO, a 3.3 x 3.3mm package with 50 BGA bumps at 400μm pitch was fabricated. The device wafer was thinned to 100μm. The die size is 1.96 × 2.36mm with pad pitch at about 90μm. The depth of the cavities on 8 in. wafer formed by Bosch process on bare Si wafer was 107μm with 8μm variation. The length and width of Si cavities is 20μm larger than die size. In the package, there is one layer Cu RDL with thickness of 3μm, minimum line width of 13.72μm. The BGA ball diameter is 280μm. All the processes were evaluated and the results showed such packages can be produced. Reliability tests including THS, T/C, HTS and HAST were carried out and no failure issue was observed. Mechanical simulation was used to analyze the stress distribution during TC test and the results showed the maximum stress was located at the RDL near the UBM. In summary, a low cost wafer level fan out technology using reconstructed Si wafer was developed. The process is simple without molding, temporary bonding and de-bonding. The reliability tests of test vehicles proved that such package is reliable. The newly developed eSiFO technology can be widely used for chips requiring fan-Out, small form factor and high density interconnects.

Advanced Manufacturing Technology for Fan-Out Wafer Level Packaging

2015 ◽  
Vol 2015 (1) ◽  
pp. 000251-000255 ◽  
Author(s):  
Doug Shelton
Keyword(s):  
High Resolution ◽  
Mass Production ◽  
High Density ◽  
Advanced Manufacturing Technology ◽  
Successful Implementation ◽  
Advanced Manufacturing ◽  
Wafer Level ◽  
Process Technology ◽  
Key Technology ◽  
Wafer Level Packaging

Advanced process technology is required to develop and enable mass production of Fan-Out Wafer-Level Packaging (FOWLP) solutions for high-density 3D and 2.5D packaging. Canon has identified key challenges that must be solved for successful implementation of high-density integration technologies and has developed key technology for Canon Litho Systems to support the most challenging processes. In this paper, Canon will present process optimization results for high-resolution patterning of wafers across large topography as well as solutions that enable litho systems to compensate for FOWLP grid error due to die placement errors.

Optimization of laser release layer, glass carrier, and organic build-up layer to enable RDL-first fan-out wafer-level packaging

2016 ◽  
Vol 2016 (1) ◽  
pp. 000190-000195 ◽  
Author(s):  
Alvin Lee ◽  
Jay Su ◽  
Baron Huang ◽  
Ram Trichur ◽  
Dongshun Bai ◽  
...  
Keyword(s):  
High Speed ◽  
Process Integration ◽  
Cost Effective ◽  
Wafer Level ◽  
Molding Compound ◽  
Fine Line ◽  
Glass Substrates ◽  
Laser Ablation Process ◽  
Wafer Level Packaging ◽  
Increasing Demand

Abstract With increasing demand for mobile devices to be lighter and thinner and consume less power while operating at high speed and high bandwidth, many equipment suppliers and assembly participants have invested great efforts to achieve fine-line fan-out wafer-level packaging (FOWLP). However, the inherent warp of reconstituted wafers, which can contribute to poor die placement accuracy and/or delamination at the interface of the build-up layer and carrier, remains a major challenge. In this study, the interactions among laser release layer, glass carrier, and build-up layer were evaluated for optimization of redistribution layer (RDL)–first FOWLP as a foundation to move toward fine-line FOWLP. In this study, a series of experiments incorporating glass carrier, laser release layer, and build-up layers were carried out to determine the optimal setup for RDL-first FOWLP. First, glass carriers (300 mm × 300 mm × 0.7 mm) with coefficients of thermal expansion of 3 and 8 ppm/°C were treated with 150-nm laser release layers. After deposition of 0.1 μm of sacrificial material on the glass carrier, 8-μm build-up layers were coated and patterned by lithography to electroplate Cu interconnections with a density of approximately 10% of the surface area. Subsequent to die attachment, molding compound was applied on top to form a 200-μm protective overcoat. The reconstituted wafer was then separated from the glass carrier through a laser ablation process using a 308-nm laser to complete the design of experiments (DOE). An experiment to study the correlation of glass carrier, laser release layer, build-up layers, and molding compound in RDL-first FOWLP processes is discussed to address full process integration on 300-mm glass substrates. The combination of glass carrier, laser release layer, build-up layer, and molding compound will pave the way for realizing cost-effective RDL-first FOWLP on panel-size substrates.

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