Modeling reactive ion etching of silicon dioxide films using neural networks

Author(s):  
B. Kim ◽  
G.S. May
1994 ◽  
Author(s):  
Masafumi Tanabe ◽  
Akio Matsuda ◽  
Takeshi Sunada ◽  
Taro Nomura ◽  
Hideki Fujimoto ◽  
...  

1979 ◽  
Vol 50 (6) ◽  
pp. 4015-4021 ◽  
Author(s):  
D. J. DiMaria ◽  
L. M. Ephrath ◽  
D. R. Young

1987 ◽  
Author(s):  
Peter C. Sukanek ◽  
Glynis Sullivan

Vacuum ◽  
1994 ◽  
Vol 45 (5) ◽  
pp. 519-524 ◽  
Author(s):  
R Jackson ◽  
AJ Pidduck ◽  
MA Green

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