Quasi-two-dimension physic-topological model of field-effect transistors (FETs) in view of the self-heating effect

Author(s):  
D.B. Sivyakov ◽  
D.R. Boldirev
2017 ◽  
Vol 111 (9) ◽  
pp. 092102 ◽  
Author(s):  
Hong Zhou ◽  
Kerry Maize ◽  
Gang Qiu ◽  
Ali Shakouri ◽  
Peide D. Ye

2011 ◽  
Vol 58 (2) ◽  
pp. 523-529 ◽  
Author(s):  
Chuan-Jia Xing ◽  
Wen-Yan Yin ◽  
Lei-Tao Liu ◽  
Jun Huang

1995 ◽  
Vol 379 ◽  
Author(s):  
Jeffrey J. Welser

ABSTRACTThe experimental application of strained-Si / relaxed-Si1−xGex heterostructures to n-MOSFETs is discussed, focusing on the enhanced mobility provided by the strain. This paper provides an overview of the theoretically-predicted electronic properties of these heterostructures, as well as their growth. Several practical issues which arise in MOS applications are covered, including the effect of the relaxed-Si1−xGex, buffer layers on diode performance, and the observation of self-heating effects in the output characteristics of the MOS transistors.


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