scholarly journals A Highly Reproducible Fabrication Process for Large-Area Plasmonic Filters for Optical Applications

IEEE Access ◽  
2018 ◽  
Vol 6 ◽  
pp. 68961-68967 ◽  
Author(s):  
Yun Seon Do
2006 ◽  
Vol 920 ◽  
Author(s):  
Zhang Hui ◽  
Tao Xiao Ming ◽  
Yu Tong Xi ◽  
Li Xin Sheng

AbstractThis paper presents an approach for decoding the pressure information exerted over a piece of fabric by means of resistive sensing. The proposed sensor includes a distributed resistive grids constructed by two systems of orthogonally contacted electrical conductive yarns, with no external sensing element to be attached on the fabric. Since the conductive yarns serve as the sensing and wiring elements simultaneously, this design simplifies the fabrication process, reduces the cost and makes the production of large area flexible pressure sensor possible. The location of the pressure applied on the fabric can be identified by detecting the position where the change of the resistances occurs between two embroidered yarns. Meanwhile, the magnitude of the pressure can be acquired by measuring the variations of the resistance. In order to eliminate the “crosstalk” effect between adjoining fibers, the yarns were separately wired on the fabric surface.


2018 ◽  
Vol 7 (1) ◽  
pp. 1800426 ◽  
Author(s):  
Young-Mi Bahk ◽  
Dai-Sik Kim ◽  
Hyeong-Ryeol Park

2020 ◽  
Author(s):  
Sihai Luo ◽  
Andrea Mancini ◽  
Rodrigo Berté ◽  
Bård H. Hoff ◽  
Stefan A. Maier ◽  
...  

Metallic nanogaps are fundamental components of nanoscale photonic and electronic devices. However, the lack of reproducible high-yield fabrication methods with nanometric control over the gap-size has hindered practical applications. Here, we report a patterning technique based on molecular self-assembly and physical peeling that allows the gap-width to be tuned over the range 3 – 30 nm and enables the fabrication of massively parallel nanogap arrays containing hundreds of millions of ring-shaped nanogaps (RSNs). The method is used here to prepare molecular diodes across sub-3-nm metallic nanogaps and to fabricate visible-light-active plasmonic substrates based on large-area, gold-based RSN arrays. The substrates are applicable to a broad range of optical applications, and are used here as substrates for surface-enhanced Raman spectroscopy (SERS), providing high enhancement factors of up to 3e8 relative to similar, gap-free thin gold films.


2019 ◽  
Vol 29 (11) ◽  
pp. 1806874 ◽  
Author(s):  
Zhouxiaosong Zeng ◽  
Xingxia Sun ◽  
Danliang Zhang ◽  
Weihao Zheng ◽  
Xiaopeng Fan ◽  
...  

2018 ◽  
Vol 31 (1) ◽  
pp. 113-119 ◽  
Author(s):  
Akira Saito ◽  
Kosei Ishibashi ◽  
Junpei Ohga ◽  
Yoshihiko Hirai ◽  
Yuji Kuwahara

2013 ◽  
Vol 592-593 ◽  
pp. 457-460
Author(s):  
Martin Klíma ◽  
Milan Holik ◽  
Vojtech Svatos ◽  
Jaromir Hubálek ◽  
Ivan Szendiuch ◽  
...  

The article deals with photo-reflective layer on Low Temperature Co-fired Ceramic substrate deposition. Measurement of diffusion and specular reflectance and roughness of layer is included. Fabrication process and its optimization is also mentioned. For measurement of deposited layer optical properties, spectrometric method in spherical chamber was used. Further, profile of layers surface was measured by profilometer to acquire dependence between roughness and reflectivity. The main aim of work is to map the possibility of creation of photo-reflective layer on electrical, chemical and thermal resistant substrate in simple way.


2012 ◽  
Vol 249-250 ◽  
pp. 747-751
Author(s):  
Yi Cheng Chen ◽  
Shi Chang Tseng

We propose the first time combining the merit of scanning and immersion lithography to fabricate 3D microstructure in this study. Via applying a matching liquid to reduce the diffraction error, the gap between the mask/resist becomes more tolerable. In addition, the liquid also act as a lubricant and a buffer for smooth movement of the mask/substrate. These advantages will benefit the performance of scanning lithography technique. The experimental results show that the large-area, 3D microstructure with excellent surface quality (Ravg<10 nm) can be successively fabricated based on this method. Besides, 3D microstructures with various geometries and functionalities can be generated by altering the shape of the mask pattern, or changing the scanning directions. The proposed SIL technique seems to be a promising way for fabricating 3D microstructure for optical applications.


2020 ◽  
Author(s):  
Sihai Luo ◽  
Andrea Mancini ◽  
Rodrigo Berté ◽  
Bård H. Hoff ◽  
Stefan A. Maier ◽  
...  

Metallic nanogaps are fundamental components of nanoscale photonic and electronic devices. However, the lack of reproducible high-yield fabrication methods with nanometric control over the gap-size has hindered practical applications. Here, we report a patterning technique based on molecular self-assembly and physical peeling that allows the gap-width to be tuned over the range 3 – 30 nm and enables the fabrication of massively parallel nanogap arrays containing hundreds of millions of ring-shaped nanogaps (RSNs). The method is used here to prepare molecular diodes across sub-3-nm metallic nanogaps and to fabricate visible-light-active plasmonic substrates based on large-area, gold-based RSN arrays. The substrates are applicable to a broad range of optical applications, and are used here as substrates for surface-enhanced Raman spectroscopy (SERS), providing high enhancement factors of up to 3e8 relative to similar, gap-free thin gold films.


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