Large area direct nanoimprinting of SiO[sub 2]–TiO[sub 2] gel gratings for optical applications

2003 ◽  
Vol 21 (2) ◽  
pp. 660 ◽  
Author(s):  
Mingtao Li ◽  
Hua Tan ◽  
Lei Chen ◽  
Jian Wang ◽  
Stephen Y. Chou
Keyword(s):  
Large Area ◽  
Optical Applications

Large-Area Metal Gaps and Their Optical Applications

2018 ◽  
Vol 7 (1) ◽  
pp. 1800426 ◽  
Author(s):  
Young-Mi Bahk ◽  
Dai-Sik Kim ◽  
Hyeong-Ryeol Park
Keyword(s):  
Large Area ◽  
Optical Applications

scholarly journals Fabrication of Size-Controlled Metallic Nanogaps down to the Sub 3-Nm Level

2020 ◽  
Author(s):  
Sihai Luo ◽  
Andrea Mancini ◽  
Rodrigo Berté ◽  
Bård H. Hoff ◽  
Stefan A. Maier ◽  
...  
Keyword(s):  
Self Assembly ◽  
Surface Enhanced Raman Spectroscopy ◽  
High Yield ◽  
Large Area ◽  
Practical Applications ◽  
Molecular Diodes ◽  
Surface Enhanced Raman ◽  
Visible Light Active ◽  
Patterning Technique ◽  
Optical Applications

Metallic nanogaps are fundamental components of nanoscale photonic and electronic devices. However, the lack of reproducible high-yield fabrication methods with nanometric control over the gap-size has hindered practical applications. Here, we report a patterning technique based on molecular self-assembly and physical peeling that allows the gap-width to be tuned over the range 3 – 30 nm and enables the fabrication of massively parallel nanogap arrays containing hundreds of millions of ring-shaped nanogaps (RSNs). The method is used here to prepare molecular diodes across sub-3-nm metallic nanogaps and to fabricate visible-light-active plasmonic substrates based on large-area, gold-based RSN arrays. The substrates are applicable to a broad range of optical applications, and are used here as substrates for surface-enhanced Raman spectroscopy (SERS), providing high enhancement factors of up to 3e8 relative to similar, gap-free thin gold films.

Controlled Vapor Growth and Nonlinear Optical Applications of Large-Area 3R Phase WS2 and WSe2 Atomic Layers

2019 ◽  
Vol 29 (11) ◽  
pp. 1806874 ◽  
Author(s):  
Zhouxiaosong Zeng ◽  
Xingxia Sun ◽  
Danliang Zhang ◽  
Weihao Zheng ◽  
Xiaopeng Fan ◽  
...  
Keyword(s):  
Nonlinear Optical ◽  
Large Area ◽  
Vapor Growth ◽  
Optical Applications ◽  
Nonlinear Optical Applications

Novel Scanning Immersion Lithography for 3D Microfabrication

2012 ◽  
Vol 249-250 ◽  
pp. 747-751
Author(s):  
Yi Cheng Chen ◽  
Shi Chang Tseng
Keyword(s):  
Surface Quality ◽  
Experimental Results ◽  
Mask Pattern ◽  
Large Area ◽  
Immersion Lithography ◽  
3D Microstructure ◽  
Smooth Movement ◽  
Optical Applications ◽  
First Time ◽  
Lithography Technique

We propose the first time combining the merit of scanning and immersion lithography to fabricate 3D microstructure in this study. Via applying a matching liquid to reduce the diffraction error, the gap between the mask/resist becomes more tolerable. In addition, the liquid also act as a lubricant and a buffer for smooth movement of the mask/substrate. These advantages will benefit the performance of scanning lithography technique. The experimental results show that the large-area, 3D microstructure with excellent surface quality (Ravg<10 nm) can be successively fabricated based on this method. Besides, 3D microstructures with various geometries and functionalities can be generated by altering the shape of the mask pattern, or changing the scanning directions. The proposed SIL technique seems to be a promising way for fabricating 3D microstructure for optical applications.

scholarly journals Fabrication of Size-Controlled Metallic Nanogaps down to the Sub 3-Nm Level

2020 ◽  
Author(s):  
Sihai Luo ◽  
Andrea Mancini ◽  
Rodrigo Berté ◽  
Bård H. Hoff ◽  
Stefan A. Maier ◽  
...  
Keyword(s):  
Self Assembly ◽  
Surface Enhanced Raman Spectroscopy ◽  
High Yield ◽  
Large Area ◽  
Practical Applications ◽  
Molecular Diodes ◽  
Surface Enhanced Raman ◽  
Visible Light Active ◽  
Patterning Technique ◽  
Optical Applications

Metallic nanogaps are fundamental components of nanoscale photonic and electronic devices. However, the lack of reproducible high-yield fabrication methods with nanometric control over the gap-size has hindered practical applications. Here, we report a patterning technique based on molecular self-assembly and physical peeling that allows the gap-width to be tuned over the range 3 – 30 nm and enables the fabrication of massively parallel nanogap arrays containing hundreds of millions of ring-shaped nanogaps (RSNs). The method is used here to prepare molecular diodes across sub-3-nm metallic nanogaps and to fabricate visible-light-active plasmonic substrates based on large-area, gold-based RSN arrays. The substrates are applicable to a broad range of optical applications, and are used here as substrates for surface-enhanced Raman spectroscopy (SERS), providing high enhancement factors of up to 3e8 relative to similar, gap-free thin gold films.

scholarly journals Recent Advancements on the CVD of Graphene on Copper from Ethanol Vapor

2020 ◽  
Vol 6 (1) ◽  
pp. 14 ◽  
Author(s):  
Giuliana Faggio ◽  
Giacomo Messina ◽  
Caterina Lofaro ◽  
Nicola Lisi ◽  
Andrea Capasso
Keyword(s):  
Vapor Deposition ◽  
Chemical Vapor ◽  
Ethanol Vapor ◽  
Degree Of Crystallinity ◽  
Large Area ◽  
Continuous Film ◽  
Metal Foils ◽  
Extensive Range ◽  
Cu Substrates ◽  
Optical Applications

Chemical vapor deposition (CVD) on metal foils is regarded as the most effective method to produce large-area graphene with properties in line with the requirements of an extensive range of electronic and optical applications. For the CVD of graphene, ethanol is a versatile carbon source alternative to the widely used methane. In this review we report on the current progress in this field showing how the CVD parameters can be modulated to gain full microstructural control on graphene grown on Cu foils. Using ethanol vapor, graphene can be grown as a continuous film with mono- or multi-layer thickness, and also in the form of isolated crystals on pre-oxidized Cu substrates. Overall, ethanol-CVD allows a controllable degree of crystallinity and tunable electrical/optical characteristics in the grown samples. In turn, this control translates into a superior versatility for device design and related applications.

scholarly journals Transfer Tiling of Nanostructures for Large-Area Fabrication

Micromachines ◽  
2018 ◽  
Vol 9 (11) ◽  
pp. 569
Author(s):  
Jaekyoung Kim ◽  
Hyunsik Yoon
Keyword(s):  
Exposure Time ◽  
Optical Component ◽  
Uv Exposure ◽  
Process Window ◽  
Shadow Mask ◽  
Large Area ◽  
Naked Eye ◽  
Nanoscale Patterns ◽  
Optical Applications ◽  
Overlapped Region

The fabrication of nanoscale patterns over a large area has been considered important but difficult, because there are few ways to satisfy both conditions. Previously, visually tolerable tiling (VTT) for fabricating nanopatterns for optical applications has been reported as a candidate for large area fabrication. The essence of VTT is the inevitable stitching of the nanoscale optical component, which is not seen by the naked eye if the boundary is very narrow while the tiles are overlapped. However, it had been difficult to control the shape of the spread of liquid prepolymers in the previous work, and there was room for the development of tiling. Here, we propose a method for transferring various shapes of tiles, which can be defined with a shadow mask. The method of using a transparent shadow mask can provide a wide process window, because it allows the spreading of a liquid prepolymer to be more easily controlled. We optimize the coating condition of a liquid prepolymer and the ultraviolet (UV) exposure time. Using this method, we can attach tiles of various shapes without a significant visible trace in the overlapped region.

Fabrication of Large-Area Patterned Nanostructures for Optical Applications by Nanoskiving

Nano Letters ◽  
2007 ◽  
Vol 7 (9) ◽  
pp. 2800-2805 ◽  
Author(s):  
Qiaobing Xu ◽  
Jiming Bao ◽  
Robert M. Rioux ◽  
Raquel Perez-Castillejos ◽  
Federico Capasso ◽  
...  
Keyword(s):  
Large Area ◽  
Optical Applications ◽  
Patterned Nanostructures

scholarly journals Processing of Dielectric Optical Coatings by Nanosecond and Femtosecond UV Laser Ablation

2008 ◽  
Vol 2008 ◽  
pp. 1-6 ◽  
Author(s):  
J. Ihlemann ◽  
J. Békési ◽  
J.-H. Klein-Wiele ◽  
P. Simon
Keyword(s):  
Laser Ablation ◽  
Bulk Material ◽  
Optical Coatings ◽  
Uv Laser ◽  
Large Area ◽  
Optical Elements ◽  
Nanosecond Lasers ◽  
Thin Oxide Films ◽  
Optical Applications ◽  
Patterned Films

Microprocessing of dielectric optical coatings by UV laser ablation is demonstrated. Excimer laser ablation at deep UV wavelengths (248 nm, 193 nm) is used for the patterning of thin oxide films or layer stacks. The layer removal over extended areas as well as sub-μm-structuring is possible. The ablation of SiO2, Al2O3, HfO2, and Ta2O5 layers and layer systems has been investigated. Due to their optical, chemical, and thermal stability, these inorganic film materials are well suited for optical applications, even if UV-transparency is required. Transparent patterned films of SiO2 are produced by patterning a UV-absorbing precursor SiOx suboxide layer and oxidizing it afterwards to SiO2. In contrast to laser ablation of bulk material, in the case of thin films, the layer-layer or layer-substrate boundaries act as predetermined end points, so that precise depth control and a very smooth surface can be achieved. For large area ablation, nanosecond lasers are well suited; for patterning with submicron resolution, femtosecond excimer lasers are applied. Thus the fabrication of optical elements like dielectric masks, pixelated diffractive elements, and gratings can be accomplished.

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