scholarly journals A NOVEL LOW THERMAL BUDGET THIN-FILM POLYSILICON FABRICATION PROCESS FOR LARGE-AREA, HIGH-THROUGHPUT SOLAR CELL PRODUCTION

2010 ◽  
Author(s):  
Yue Kuo
Keyword(s):  
Thin Film ◽  
Solar Cell ◽  
High Throughput ◽  
Fabrication Process ◽  
Large Area ◽  
Thermal Budget ◽  
Cell Production ◽  
Low Thermal Budget

LARGE AREA THIN FILM CADMIUM SULFIDE SOLAR CELL ARRAY INVESTIGATION

1963 ◽  
Author(s):  
J. C. Schaefer ◽  
R. J. Humrick ◽  
E. R. Hill
Keyword(s):  
Thin Film ◽  
Solar Cell ◽  
Cadmium Sulfide ◽  
Cell Array ◽  
Large Area

High throughput two-step ultrasonic spray deposited CH3NH3PbI3 thin film layer for solar cell application

2018 ◽  
Vol 390 ◽  
pp. 270-277 ◽  
Author(s):  
Ding-Hung Lan ◽  
Shao-Huan Hong ◽  
Li-Hui Chou ◽  
Xiao-Feng Wang ◽  
Cheng-Liang Liu
Keyword(s):  
Thin Film ◽  
Solar Cell ◽  
High Throughput ◽  
Solar Cell Application ◽  
Ultrasonic Spray ◽  
Thin Film Layer ◽  
Film Layer

scholarly journals Operation of thin-film thermoelectric generator of Ge-rich poly-Ge1-x Sn x on SiO2 fabricated by a low thermal budget process

2019 ◽  
Vol 12 (5) ◽  
pp. 051016
Author(s):  
Kouta Takahashi ◽  
Hiroshi Ikenoue ◽  
Mitsuo Sakashita ◽  
Osamu Nakatsuka ◽  
Shigeaki Zaima ◽  
...  
Keyword(s):  
Thin Film ◽  
Thermoelectric Generator ◽  
Budget Process ◽  
Thermal Budget ◽  
Low Thermal Budget

Low-Thermal-Budget Solution Processing of Thin Films of Zinc Ferrite and Other Complex Oxides

2012 ◽  
Vol 1400 ◽  
Author(s):  
Ranajit Sai ◽  
Suresh D. Kulkarni ◽  
K. J. Vinoy ◽  
Navakanta Bhat ◽  
S. A. Shivashankar
Keyword(s):  
Thin Films ◽  
Zinc Ferrite ◽  
Film Deposition ◽  
Vacuum System ◽  
Molar Ratio ◽  
Large Area ◽  
Thermal Budget ◽  
Control Film ◽  
Circuit Components ◽  
Low Thermal Budget

ABSTRACTFurther miniaturization of magnetic and electronic devices demands thin films of advanced nanomaterials with unique properties. Spinel ferrites have been studied extensively owing to their interesting magnetic and electrical properties coupled with stability against oxidation. Being an important ferrospinel, zinc ferrite has wide applications in the biological (MRI) and electronics (RF-CMOS) arenas. The performance of an oxide like ZnFe2O4depends on stoichiometry (defect structure), and technological applications require thin films of high density, low porosity and controlled microstructure, which depend on the preparation process. While there are many methods for the synthesis of polycrystalline ZnFe2O4powder, few methods exist for the deposition of its thin films, where prolonged processing at elevated temperature is not required. We report a novel, microwave-assisted, low temperature (<100°C) deposition process that is conducted in the liquid medium, developed for obtaining high quality, polycrystalline ZnFe2O4thin films on technologically important substrates like Si(100). An environment-friendly solvent (ethanol) and non-hazardous oxide precursors (β-diketonates of Zn and Fe in 1:2 molar ratio), forming a solution together, is subjected to irradiation in a domestic microwave oven (2.45 GHz) for a few minutes, leading to reactions which result in the deposition of ZnFe2O4films on Si (100) substrates suspended in the solution. Selected surfactants added to the reactant solution in optimum concentration can be used to control film microstructure. The nominal temperature of the irradiated solution, i.e., film deposition temperature, seldom exceeds 100°C, thus sharply lowering the thermal budget. Surface roughness and uniformity of large area depositions (50x50 mm2) are controlled by tweaking the concentration of the mother solution. Thickness of the films thus grown on Si (100) within 5 min of microwave irradiation can be as high as several microns. The present process, not requiring a vacuum system, carries a very low thermal budget and, together with a proper choice of solvents, is compatible with CMOS integration. This novel solution-based process for depositing highly resistive, adherent, smooth ferrimagnetic films on Si (100) is promising to RF engineers for the fabrication of passive circuit components. It is readily extended to a wide variety of functional oxide films.

scholarly journals Low-temperature and low thermal budget fabrication of polycrystalline silicon thin-film transistors

1996 ◽  
Vol 17 (11) ◽  
pp. 503-505 ◽  
Author(s):  
Hsiao-Yi Lin ◽  
Chun-Yen Chang ◽  
Tan Fu Lei ◽  
Feng-Ming Liu ◽  
Wen-Luh Yang ◽  
...  
Keyword(s):  
Thin Film ◽  
Low Temperature ◽  
Thin Film Transistors ◽  
Polycrystalline Silicon ◽  
Silicon Thin Film ◽  
Thermal Budget ◽  
Low Thermal Budget

scholarly journals Removal Mechanism and Defect Characterization for Glass-Side Laser Scribing of CdTe/CdS Multilayer in Solar Cells

2015 ◽  
Vol 137 (6) ◽  
Author(s):  
Hongliang Wang ◽  
Y. Lawrence Yao ◽  
Hongqiang Chen
Keyword(s):  
Thin Film ◽  
Solar Cells ◽  
Solar Cell ◽  
Large Scale ◽  
Numerical Models ◽  
Removal Mechanism ◽  
Large Area ◽  
Numerical Work ◽  
Solar Module ◽  
Laser Scribing

Laser scribing is an important manufacturing process used to reduce photocurrent and resistance losses and increase solar cell efficiency through the formation of serial interconnections in large-area solar cells. High-quality scribing is crucial since the main impediment to large-scale adoption of solar power is its high-production cost (price-per-watt) compared to competing energy sources such as wind and fossil fuels. In recent years, the use of glass-side laser scribing processes has led to increased scribe quality and solar cell efficiencies; however, defects introduced during the process such as thermal effect, microcracks, film delamination, and removal uncleanliness keep the modules from reaching their theoretical efficiencies. Moreover, limited numerical work has been performed in predicting thin-film laser removal processes. In this study, a nanosecond (ns) laser with a wavelength at 532 nm is employed for pattern 2 (P2) scribing on CdTe (cadmium telluride) based thin-film solar cells. The film removal mechanism and defects caused by laser-induced micro-explosion process are studied. The relationship between those defects, removal geometry, laser fluences, and scribing speeds are also investigated. Thermal and mechanical numerical models are developed to analyze the laser-induced spatiotemporal temperature and pressure responsible for film removal. The simulation can well-predict the film removal geometries, transparent conducting oxide (TCO) layer thermal damage, generation of microcracks, film delamination, and residual materials. The characterization of removal qualities will enable the process optimization and design required to enhance solar module efficiency.

scholarly journals Pulse Thermal Processing for Low Thermal Budget Integration of IGZO Thin Film Transistors

2015 ◽  
Vol 3 (3) ◽  
pp. 297-301 ◽  
Author(s):  
Joo Hyon Noh ◽  
Pooran C. Joshi ◽  
Teja Kuruganti ◽  
Philip D. Rack
Keyword(s):  
Thin Film ◽  
Thermal Processing ◽  
Thin Film Transistors ◽  
Thermal Budget ◽  
Low Thermal Budget
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