High-responsivity InGaAs MSM photodetectors with semi-transparent Schottky contacts

1995 ◽  
Vol 7 (11) ◽  
pp. 1333-1335 ◽  
Author(s):  
Rong-Hen Yuang ◽  
Jen-Inn Chyi ◽  
Yi-Jen Chan ◽  
Wei Lin ◽  
Yuan-Kuang Tu
Nanoscale ◽  
2014 ◽  
Vol 6 (19) ◽  
pp. 11232-11239 ◽  
Author(s):  
K. Das ◽  
S. Mukherjee ◽  
S. Manna ◽  
S. K. Ray ◽  
A. K. Raychaudhuri

Single silicon nanowire-based MSM photodetectors show ultra high responsivity (>104 A W−1) in the near-infra-red region, even at zero bias. The observed photoresponse is sensitive to the polarization of the exciting light, allowing the device to act as a polarization-dependent photodetector.


1997 ◽  
Vol 9 (5) ◽  
pp. 657-659 ◽  
Author(s):  
A.C. Davidson ◽  
F.W. Wise ◽  
R.C. Compton ◽  
D.T. Emerson ◽  
J.R. Shealy ◽  
...  

2007 ◽  
Author(s):  
W. C. Chen ◽  
Y. K. Su ◽  
R. W. Chuang ◽  
H. C. Yu ◽  
B. Y. Chen

1995 ◽  
Vol 7 (12) ◽  
pp. 1483-1485 ◽  
Author(s):  
B.C. Tousley ◽  
N. Davids ◽  
A.H. Sayles ◽  
A. Paolella ◽  
P. Cooke ◽  
...  

2007 ◽  
Vol 1057 ◽  
Author(s):  
Jason L. Johnson ◽  
Ashkan Behnam ◽  
Yongho Choi ◽  
Leila Noriega ◽  
Gunhan Ertosun ◽  
...  

ABSTRACTWe experimentally study the dark and photocurrent in metal-semiconductor-metal (MSM) photodetectors based on single-walled carbon nanotube film Schottky contacts on GaAs. We find that above ∼260°K, thermionic emission of electrons with a barrier height of ∼0.54 eV is the dominant dark current transport mechanism. Furthermore, MSM devices with CNT film electrodes exhibit a higher photocurrent-to-dark current ratio while maintaining a comparable responsivity relative to control devices. This work demonstrates that nanotube films can be integrated as Schottky electrodes in conventional semiconductor optoelectronic devices.


2008 ◽  
Vol 23 (3) ◽  
pp. 035027 ◽  
Author(s):  
W C Chen ◽  
Y K Su ◽  
R W Chuang ◽  
H C Yu ◽  
B Y Chen ◽  
...  

1999 ◽  
Vol 597 ◽  
Author(s):  
Ch. Buchal ◽  
A. Roelofs ◽  
M. Siegert ◽  
M. Löken

AbstractWe present data on the fabrication process of optical waveguides from four different polymers, which have been patterned either by standard lithographical masking and reactive ion beam etching (RIE) or by direct lithographical exposure of photosensitive material. Three of the resists were directly photosensitive, they could be exposed and developed. Thereafter they can be cured and remain stable. Waveguide losses of 3.5 dB/cm had to be accepted for the photosensitive materials, while the non-sensitive polymers formed very good guides (0.8 dB/cm), but were more difficult to process. We demonstrate the coupling of the strip waveguides to optical fibers on one side and to very thin metal-semiconductor-metal (MSM) photodetectors at the other side. A beam propagation method computer code has been used to evaluate the best coupling efficiencies between the guides and the detectors, which are ultrafast (3.5 ps FWHM) due to their very thin silicon slab design (Si thickness 400 nm, sandwiched between two Schottky contacts).


Sign in / Sign up

Export Citation Format

Share Document