Evaluation of amorphous carbon nitride thin film for magnetic rigid thin film disk by IR spectroscopy

1997 ◽  
Vol 33 (5) ◽  
pp. 3106-3108 ◽  
Author(s):  
Youmin Liu ◽  
Chi Jiaa ◽  
Hoa Do ◽  
A. Eltonkhy
Keyword(s):  
Thin Film ◽  
Ir Spectroscopy ◽  
Amorphous Carbon ◽  
Carbon Nitride ◽  
Amorphous Carbon Nitride

AMORPHOUS CARBON NITRIDE THIN FILM AS A BARRIER AGAINST COPPER DIFFUSION

2002 ◽  
Vol 16 (06n07) ◽  
pp. 1127-1131 ◽  
Author(s):  
JIANG NING ◽  
S. XU ◽  
J. W. CHAI ◽  
L. K. CHEN ◽  
ALEX SEE ◽  
...  
Keyword(s):  
Thin Film ◽  
Amorphous Carbon ◽  
Photoelectron Spectroscopy ◽  
Carbon Nitride ◽  
Effective Diffusion ◽  
Rf Magnetron Sputtering ◽  
Copper Diffusion ◽  
Amorphous Carbon Nitride ◽  
Film Annealing

The application of carbon nitride as a barrier against copper diffusion was investigated. Amorphous carbon nitride (a-CN) thin films were prepared on Si(100) substrates by rf magnetron sputtering of graphite target in N2 plasma. A thin Cu layer was then deposited in-situ atop of the a-CN film. Annealing process was carried out in nitrogen (N2) ambient at the temperature of 400°C and 600°C respectively. The as-deposited and annealed films were characterized by x-ray photoelectron spectroscopy (XPS). The measurements show that both sp2C-N and sp3-N bonds were formed in the as-deposited carbon nitride films. The compositional analyses indicate that the deposited a-CN thin film is able to act as an effective diffusion barrier against copper at annealing temperature up to 400°C.

Characterization of amorphous carbon nitride by bottom-gated thin-film structure

2006 ◽  
Vol 15 (4-8) ◽  
pp. 1015-1018 ◽  
Author(s):  
Yasuhiko Hayashi ◽  
N. Kamada ◽  
T. Soga ◽  
T. Jimbo
Keyword(s):  
Thin Film ◽  
Amorphous Carbon ◽  
Carbon Nitride ◽  
Film Structure ◽  
Thin Film Structure ◽  
Amorphous Carbon Nitride

Tribological Behavior of Amorphous Carbon Nitride Overcoats for Magnetic Thin-Film Rigid Disks

1996 ◽  
Vol 118 (3) ◽  
pp. 543-548 ◽  
Author(s):  
Eric C. Cutiongco ◽  
Dong Li ◽  
Yip-Wah Chung ◽  
C. Singh Bhatia
Keyword(s):  
Thin Film ◽  
Amorphous Carbon ◽  
Carbon Nitride ◽  
Magnetic Thin Film ◽  
Argon Plasmas ◽  
Nitride Coatings ◽  
Rigid Disks ◽  
Amorphous Carbon Nitride ◽  
Carbon Overcoats ◽  
Pin On Disk

Amorphous carbon nitride coatings of thickness of 5 and 30 nm were deposited onto 65 and 95 mm magnetic thin-film rigid disks surfaces using single-cathode and dual-cathode magnetron sputtering systems containing nitrogen-argon plasmas. Under optimum deposition conditions, amorphous carbon nitride coatings can be synthesized on ultrasmooth thin-film disks with no significant pinholes at thickness down to 5 nm, with hardness 22–28 GPa (compared to 7–12 GPa for amorphous carbon), and r.m.s. roughness as low as 0.25 nm. These amorphous carbon nitride coatings were shown to have better contact-start-stop performance and three-to-four times better pin-on-disk contact durability compared with amorphous carbon overcoats under identical testing conditions. Amorphous carbon nitride appears to be a promising candidate overcoat material for replacing amorphous carbon in the next-generation magnetic thin-film rigid disk systems.

Deposition mechanism of sputtered amorphous carbon nitride thin film

2004 ◽  
Vol 223 (4) ◽  
pp. 269-274 ◽  
Author(s):  
O. Durand-Drouhin ◽  
M. Benlahsen ◽  
M. Clin ◽  
R. Bouzerar
Keyword(s):  
Thin Film ◽  
Amorphous Carbon ◽  
Carbon Nitride ◽  
Deposition Mechanism ◽  
Amorphous Carbon Nitride

Amorphous Carbon Nitride with Three Coordinate Nitrogen (N3 C ) Vacancies for Exceptional NO x Abatement in Visible Light

2021 ◽  
pp. 2004001
Author(s):  
Youyu Duan ◽  
Yang Wang ◽  
Liyong Gan ◽  
Jiazhi Meng ◽  
Yajie Feng ◽  
...  
Keyword(s):  
Visible Light ◽  
Amorphous Carbon ◽  
Carbon Nitride ◽  
Amorphous Carbon Nitride

X-RAY PHOTOELECTRON SPECTROSCOPY STUDIES ON THE BONDING PROPERTIES OF AMORPHOUS CARBON NITRIDE FILMS SYNTHESIZED BY PULSED LASER DEPOSITION WITH DIFFERENT SUBSTRATE TEMPERATURES

2005 ◽  
Vol 12 (02) ◽  
pp. 185-195
Author(s):  
M. RUSOP ◽  
T. SOGA ◽  
T. JIMBO
Keyword(s):  
Pulsed Laser Deposition ◽  
Amorphous Carbon ◽  
Photoelectron Spectroscopy ◽  
Carbon Nitride ◽  
Measurement Techniques ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
X Ray ◽  
Amorphous Carbon Nitride ◽  
Substrate Temperatures

Amorphous carbon nitride films ( a-CN x) were deposited by pulsed laser deposition of camphoric carbon target with different substrate temperatures (ST). The influence of ST on the synthesis of a-CN x films was investigated. The nitrogen-to-carbon (N/C) and oxygen-to-carbon (O/C) atomic ratios, bonding state, and microstructure of the deposited a-CN x films were characterized by X-ray photoelectron spectroscopy and were confirmed by other standard measurement techniques. The bonding states between C and N , and C and O in the deposited films were found to be significantly influenced by ST during the deposition process. The N/C and O/C atomic ratios of the a-CN x films reached the maximum value at 400°C. ST of 400°C was proposed to promote the desired sp 3-hybridized C and the C 3 N 4 phase. The C–N bonding of C–N , C=N and C≡N were observed in the films.

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