Screen-printed carbon electrode modified on its surface with amorphous carbon nitride thin film: Electrochemical and morphological study

2007 ◽  
Vol 52 (15) ◽  
pp. 5053-5061 ◽  
Author(s):  
F. Ghamouss ◽  
P.-Y. Tessier ◽  
A. Djouadi ◽  
M.-P. Besland ◽  
M. Boujtita
Keyword(s):  
Thin Film ◽  
Amorphous Carbon ◽  
Morphological Study ◽  
Carbon Nitride ◽  
Carbon Electrode ◽  
Screen Printed Carbon Electrode ◽  
Amorphous Carbon Nitride ◽  
Screen Printed

AMORPHOUS CARBON NITRIDE THIN FILM AS A BARRIER AGAINST COPPER DIFFUSION

2002 ◽  
Vol 16 (06n07) ◽  
pp. 1127-1131 ◽  
Author(s):  
JIANG NING ◽  
S. XU ◽  
J. W. CHAI ◽  
L. K. CHEN ◽  
ALEX SEE ◽  
...  
Keyword(s):  
Thin Film ◽  
Amorphous Carbon ◽  
Photoelectron Spectroscopy ◽  
Carbon Nitride ◽  
Effective Diffusion ◽  
Rf Magnetron Sputtering ◽  
Copper Diffusion ◽  
Amorphous Carbon Nitride ◽  
Film Annealing

The application of carbon nitride as a barrier against copper diffusion was investigated. Amorphous carbon nitride (a-CN) thin films were prepared on Si(100) substrates by rf magnetron sputtering of graphite target in N2 plasma. A thin Cu layer was then deposited in-situ atop of the a-CN film. Annealing process was carried out in nitrogen (N2) ambient at the temperature of 400°C and 600°C respectively. The as-deposited and annealed films were characterized by x-ray photoelectron spectroscopy (XPS). The measurements show that both sp2C-N and sp3-N bonds were formed in the as-deposited carbon nitride films. The compositional analyses indicate that the deposited a-CN thin film is able to act as an effective diffusion barrier against copper at annealing temperature up to 400°C.

Characterization of amorphous carbon nitride by bottom-gated thin-film structure

2006 ◽  
Vol 15 (4-8) ◽  
pp. 1015-1018 ◽  
Author(s):  
Yasuhiko Hayashi ◽  
N. Kamada ◽  
T. Soga ◽  
T. Jimbo
Keyword(s):  
Thin Film ◽  
Amorphous Carbon ◽  
Carbon Nitride ◽  
Film Structure ◽  
Thin Film Structure ◽  
Amorphous Carbon Nitride

Tribological Behavior of Amorphous Carbon Nitride Overcoats for Magnetic Thin-Film Rigid Disks

1996 ◽  
Vol 118 (3) ◽  
pp. 543-548 ◽  
Author(s):  
Eric C. Cutiongco ◽  
Dong Li ◽  
Yip-Wah Chung ◽  
C. Singh Bhatia
Keyword(s):  
Thin Film ◽  
Amorphous Carbon ◽  
Carbon Nitride ◽  
Magnetic Thin Film ◽  
Argon Plasmas ◽  
Nitride Coatings ◽  
Rigid Disks ◽  
Amorphous Carbon Nitride ◽  
Carbon Overcoats ◽  
Pin On Disk

Amorphous carbon nitride coatings of thickness of 5 and 30 nm were deposited onto 65 and 95 mm magnetic thin-film rigid disks surfaces using single-cathode and dual-cathode magnetron sputtering systems containing nitrogen-argon plasmas. Under optimum deposition conditions, amorphous carbon nitride coatings can be synthesized on ultrasmooth thin-film disks with no significant pinholes at thickness down to 5 nm, with hardness 22–28 GPa (compared to 7–12 GPa for amorphous carbon), and r.m.s. roughness as low as 0.25 nm. These amorphous carbon nitride coatings were shown to have better contact-start-stop performance and three-to-four times better pin-on-disk contact durability compared with amorphous carbon overcoats under identical testing conditions. Amorphous carbon nitride appears to be a promising candidate overcoat material for replacing amorphous carbon in the next-generation magnetic thin-film rigid disk systems.

Deposition mechanism of sputtered amorphous carbon nitride thin film

2004 ◽  
Vol 223 (4) ◽  
pp. 269-274 ◽  
Author(s):  
O. Durand-Drouhin ◽  
M. Benlahsen ◽  
M. Clin ◽  
R. Bouzerar
Keyword(s):  
Thin Film ◽  
Amorphous Carbon ◽  
Carbon Nitride ◽  
Deposition Mechanism ◽  
Amorphous Carbon Nitride

Amorphous Carbon Nitride with Three Coordinate Nitrogen (N3 C ) Vacancies for Exceptional NO x Abatement in Visible Light

2021 ◽  
pp. 2004001
Author(s):  
Youyu Duan ◽  
Yang Wang ◽  
Liyong Gan ◽  
Jiazhi Meng ◽  
Yajie Feng ◽  
...  
Keyword(s):  
Visible Light ◽  
Amorphous Carbon ◽  
Carbon Nitride ◽  
Amorphous Carbon Nitride

Biological Multilayer Films Assembled by Redox Polymer and HRP on Screen-Printed Carbon Electrode

2012 ◽  
Vol 571 ◽  
pp. 56-59
Author(s):  
Yu Fang Sha ◽  
Mei Zhao ◽  
Ming Quan Yang ◽  
Hai Xin Bai ◽  
Man Zhao
Keyword(s):  
Horseradish Peroxidase ◽  
Electrostatic Interaction ◽  
Electrode Surface ◽  
Multilayer Films ◽  
Carbon Electrode ◽  
Layer By Layer ◽  
Redox Polymer ◽  
Screen Printed Carbon Electrode ◽  
Positively Charged ◽  
Screen Printed

Biological multilayer films of redox polymer and horseradish peroxidase (HRP) were successfully assembled on a screen-printed carbon electrode using layer-by-layer (LBL) assembled method based on the electrostatic interaction. The screen-printed carbon electrode surface was modified by the positively charged redox polymer, and the negatively charged HRP by LBL method.

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