Hot-carrier degradation behavior of thin-film SOI nMOSFET with isolation scheme and buried oxide thickness

Jong-Wook Lee;  Hyung-Ki Kim;  Woo-Han Lee;  Min-Rok Oh;  Yo-Hwan Koh

doi:10.1109/16.841235

Hot-carrier degradation behavior of thin-film SOI nMOSFET with isolation scheme and buried oxide thickness

IEEE Transactions on Electron Devices ◽

10.1109/16.841235 ◽

2000 ◽

Vol 47 (5) ◽

pp. 1013-1017 ◽

Cited By ~ 6

Author(s):

Jong-Wook Lee ◽

Hyung-Ki Kim ◽

Woo-Han Lee ◽

Min-Rok Oh ◽

Yo-Hwan Koh

Keyword(s):

Thin Film ◽

Oxide Thickness ◽

Degradation Behavior ◽

Hot Carrier ◽

Buried Oxide ◽

Hot Carrier Degradation

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Positive Bias Temperature Instability and Hot Carrier Degradation of Back-End-of-Line, nm-Thick, In2O3 Thin-Film Transistors

IEEE Electron Device Letters ◽

10.1109/led.2021.3134902 ◽

2021 ◽

pp. 1-1

Author(s):

Yen-Pu Chen ◽

Mengwei Si ◽

Bikram Kishore Mahajan ◽

Zehao Lin ◽

Peide D. Ye ◽

...

Keyword(s):

Thin Film ◽

Thin Film Transistors ◽

Positive Bias ◽

Temperature Instability ◽

Hot Carrier ◽

Bias Temperature Instability ◽

Hot Carrier Degradation

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Hot-Carrier Degradation and Electric Field and Electron Concentration near Drain Junction in Low-Temperature N-Channel Single Drain and Lightly Doped Drain Polycrystalline Silicon Thin Film Transistors

Japanese Journal of Applied Physics ◽

10.1143/jjap.46.1322 ◽

2007 ◽

Vol 46 (3B) ◽

pp. 1322-1327 ◽

Cited By ~ 5

Author(s):

Gen Usami ◽

Yukisato Nogami ◽

Toshihisa Yajima ◽

Masahiro Yamagata ◽

Toshifumi Satoh ◽

...

Keyword(s):

Thin Film ◽

Low Temperature ◽

Electric Field ◽

Electron Concentration ◽

Thin Film Transistors ◽

Polycrystalline Silicon ◽

Silicon Thin Film ◽

Hot Carrier ◽

Lightly Doped Drain ◽

Hot Carrier Degradation

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Observation of combined self-heating and hot-carrier degradation in n-type poly-Si thin-film transistors

2009 16th IEEE International Symposium on the Physical and Failure Analysis of Integrated Circuits ◽

10.1109/ipfa.2009.5232559 ◽

2009 ◽

Author(s):

Meng ◽

Mingxiang ◽

Huaisheng ◽

Dongli ◽

Man

Keyword(s):

Thin Film ◽

Thin Film Transistors ◽

Hot Carrier ◽

Self Heating ◽

Si Thin Film ◽

Hot Carrier Degradation

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Effective density-of-states distribution of polycrystalline silicon thin-film transistors under hot-carrier degradation

Journal of Applied Physics ◽

10.1063/1.2777804 ◽

2007 ◽

Vol 102 (5) ◽

pp. 054508 ◽

Cited By ~ 15

Author(s):

Ming-Hsien Lee ◽

Kai-Hsiang Chang ◽

Horng-Chih Lin

Keyword(s):

Thin Film ◽

Density Of States ◽

Thin Film Transistors ◽

Polycrystalline Silicon ◽

Effective Density ◽

Silicon Thin Film ◽

Hot Carrier ◽

Hot Carrier Degradation

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Gate Voltage Pulse Rising Edge Dependent Dynamic Hot Carrier Degradation in Poly-Si Thin-Film Transistors

IEEE Electron Device Letters ◽

10.1109/led.2021.3110916 ◽

2021 ◽

pp. 1-1

Author(s):

Lekai Chen ◽

Mingxiang Wang ◽

Dongli Zhang ◽

Huaisheng Wang

Keyword(s):

Thin Film ◽

Gate Voltage ◽

Voltage Pulse ◽

Thin Film Transistors ◽

Hot Carrier ◽

Si Thin Film ◽

Hot Carrier Degradation

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Hot carrier degradation behavior in SOI dynamic-threshold-voltage nMOSFET’s (n-DTMOSFET) measured by gated-diode configuration

Microelectronics Reliability ◽

10.1016/s0026-2714(03)00038-6 ◽

2003 ◽

Vol 43 (5) ◽

pp. 707-711

Author(s):

Ru Huang ◽

Jinyan Wang ◽

Jin He ◽

Min Yu ◽

Xing Zhang ◽

...

Keyword(s):

Threshold Voltage ◽

Dynamic Threshold ◽

Degradation Behavior ◽

Hot Carrier ◽

Hot Carrier Degradation

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Impact of Gate Oxide Thickness Scaling on Hot-Carrier Degradation in Deep-sub-micron nMOSFETs

30th European Solid-State Device Research Conference ◽

10.1109/essderc.2000.194732 ◽

2000 ◽

Cited By ~ 1

Author(s):

K.G. Anil ◽

T. Pompl ◽

I. Eisele

Keyword(s):

Gate Oxide ◽

Oxide Thickness ◽

Hot Carrier ◽

Gate Oxide Thickness ◽

Hot Carrier Degradation

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An investigation of drain pulse induced hot carrier degradation in n-type low temperature polycrystalline silicon thin film transistors

Microelectronics Reliability ◽

10.1016/j.microrel.2010.01.024 ◽

2010 ◽

Vol 50 (5) ◽

pp. 713-716 ◽

Cited By ~ 10

Author(s):

Meng Zhang ◽

Mingxiang Wang

Keyword(s):

Thin Film ◽

Low Temperature ◽

Thin Film Transistors ◽

Polycrystalline Silicon ◽

Silicon Thin Film ◽

Hot Carrier ◽

Hot Carrier Degradation

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Comparisons of hot-carrier degradation behavior in SOI-LIGBT and SOI-LDMOS with different stress conditions

Solid-State Electronics ◽

10.1016/j.sse.2010.07.010 ◽

2010 ◽

Vol 54 (12) ◽

pp. 1598-1601 ◽

Cited By ~ 9

Author(s):

Siyang Liu ◽

Weifeng Sun ◽

Qinsong Qian ◽

Jing Zhu

Keyword(s):

Stress Conditions ◽

Degradation Behavior ◽

Hot Carrier ◽

Hot Carrier Degradation

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Threshold voltage dependence of LOCOS-isolated thin-film SOI NMOSFET on buried oxide thickness

IEEE Electron Device Letters ◽

10.1109/55.784458 ◽

1999 ◽

Vol 20 (9) ◽

pp. 478-480 ◽

Cited By ~ 6

Author(s):

Jong-Wook Lee ◽

Hyung-Ki Kim ◽

Min-Rok Oh ◽

Yo-Hwan Koh

Keyword(s):

Thin Film ◽

Threshold Voltage ◽

Voltage Dependence ◽

Oxide Thickness ◽

Buried Oxide

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