Two-dimensional implications of a purely reactive model for plasma etching

1991 ◽  
Vol 38 (9) ◽  
pp. 2025-2032 ◽  
Author(s):  
A.F. Gerodolle ◽  
J. Pelletier
Keyword(s):  
Plasma Etching ◽  
Two Dimensional

Understanding Anisotropic Plasma Etching of Two-Dimensional Polystyrene Opals for Advanced Materials Fabrication

Langmuir ◽  
2014 ◽  
Vol 30 (41) ◽  
pp. 12354-12361 ◽  
Author(s):  
Eser M. Akinoglu ◽  
Anthony J. Morfa ◽  
Michael Giersig
Keyword(s):  
Plasma Etching ◽  
Anisotropic Plasma ◽  
Advanced Materials ◽  
Two Dimensional

Tuning the thickness of exfoliated quasi-two-dimensional β-Ga2O3 flakes by plasma etching

2017 ◽  
Vol 110 (13) ◽  
pp. 131901 ◽  
Author(s):  
Yongbeom Kwon ◽  
Geonyeop Lee ◽  
Sooyeoun Oh ◽  
Jihyun Kim ◽  
Stephen J. Pearton ◽  
...  
Keyword(s):  
Plasma Etching ◽  
Two Dimensional

scholarly journals Inductively coupled plasma etching of two-dimensional InP/InGaAsP-based photonic crystal

2007 ◽  
Vol 56 (2) ◽  
pp. 977
Author(s):  
Ma Xiao-Tao ◽  
Zheng Wan-Hua ◽  
Ren Gang ◽  
Fan Zhong-Chao ◽  
Chen Liang-Hui
Keyword(s):  
Photonic Crystal ◽  
Plasma Etching ◽  
Inductively Coupled Plasma ◽  
Two Dimensional ◽  
Inductively Coupled Plasma Etching ◽  
Inductively Coupled

TWO-DIMENSIONAL ORDERED POROUS STRUCTURES FOR PHOTONIC CRYSTALS OBTAINED USING DEEP ANODIC ETCHING AND FOCUSED ION BEAM TECHNIQUES

2004 ◽  
Vol 03 (01n02) ◽  
pp. 81-85
Author(s):  
E. Yu. GAVRILIN ◽  
Yu. B. GORBATOV ◽  
V. V. STARKOV ◽  
A. F. VYATKIN
Keyword(s):  
Photonic Crystals ◽  
Plasma Etching ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Visible Region ◽  
Two Dimensional ◽  
Porous Structures ◽  
Ordered Structure ◽  
Anodic Etching ◽  
Ordered Porous

Photonic crystals are the very promising novel materials for micro- and nanophotonics for visible region. To produce photonic crystals for this region of light, artificial structures with characteristic sizes less than 1 μm have to be manufactured. Electrochemical deep anodic etching and plasma etching techniques is normally used to produce such structures in silicon wafers. However, standard way of deep anodic etching realization is not suitable for sub-micrometer porous silicon formation. In the present work combination of the deep anodic etching and focused ion beam techniques is used to produce ordered structure of macropores in silicon.

Fabrication and Testing of a Micromirror Device Actuated by PZT Thin Films

2006 ◽  
Vol 3 (4) ◽  
pp. 209-215
Author(s):  
Z.M. Xiao ◽  
B.J. Chen ◽  
H. Fan
Keyword(s):  
Thin Films ◽  
Plasma Etching ◽  
Sol Gel ◽  
Two Dimensional ◽  
Release Process ◽  
Scanning Angle ◽  
Pzt Thin Films ◽  
Resonance Frequencies ◽  
Bimorph Beam

The paper describes the fabrication and characterization of two-dimensional resonant micromirror device actuated by sol-gel deposited PZT thin films. The actuation principle is based on the bimorph beam structure, which consists of an oxide layer and a piezoelectric PZT layer. The two-dimensional scanning performance can be achieved by applying AC voltages with phase shifts at resonance to the actuating beams. The devices are fabricated through thin film depositions, lithography, dry plasma etching and the ICP release process. For a micromirror structure with a 300μm ×300μm mirror plate, the first four resonance frequencies are measured to be in the range of 10–30 kHz. To investigate the vibration modes, the deflections on different locations of the mirror plate are measured. The two dimensional scanning angle is determined to be in one direction and 11° at 23.4 kHz in the perpendicular direction.

Sign in / Sign up

Export Citation Format

Share Document