On the hot-carrier-induced post-stress interface trap generation in n-channel MOS transistors
1994 ◽
Vol 41
(3)
◽
pp. 413-419
◽
1999 ◽
Vol 46
(4)
◽
pp. 738-746
◽
1988 ◽
Vol 49
(C4)
◽
pp. C4-651-C4-655
◽