Formation of defect complexes by electron-irradiation of hydrogenated crystalline silicon

2000 ◽  
Vol 63 (3) ◽  
Author(s):  
Masashi Suezawa
1999 ◽  
Vol 557 ◽  
Author(s):  
J. Yamasaki ◽  
S. Takeda

AbstractThe structural properties of the amorphous Si (a-Si), which was created from crystalline silicon by 2 MeV electron irradiation at low temperatures about 25 K, are examined in detail by means of transmission electron microscopy and transmission electron diffraction. The peak positions in the radial distribution function (RDF) of the a-Si correspond well to those of a-Si fabricated by other techniques. The electron-irradiation-induced a-Si returns to crystalline Si after annealing at 550°C.


1985 ◽  
Vol 59 ◽  
Author(s):  
S. J. Pearton

ABSTRACTThe ability of hydrogen to migrate in crystalline Si at low temperatures (<400°C) and bond to a variety of both shallow and deep level impurities, passivating their electrical activity, is of fundamental and technological interest. Recent results on the deactivation of the shallow acceptors in Si are compared with similar experiments in other semiconductors, microscopic models are proposed, and the implications for the states of hydrogen in the Si lattice at a variety of temperatures, and the diffusivity of some of these different states, is discussed. New results on the migration of atomic hydrogen under electronic stimulation are also detailed, along with a compendium of the deep levels in Si passivated by reaction with hydrogen. Surface damage by hydrogen-containing plasmas, and the infrared and electrical properties of H-related defect complexes are also reviewed.


2015 ◽  
Vol 118 (13) ◽  
pp. 135703 ◽  
Author(s):  
V. Quemener ◽  
B. Raeissi ◽  
F. Herklotz ◽  
L. I. Murin ◽  
E. V. Monakhov ◽  
...  

1995 ◽  
Vol 77 (7) ◽  
pp. 3146-3154 ◽  
Author(s):  
Einar Ö. Sveinbjörnsson ◽  
Sigurgeir Kristjansson ◽  
Haflidi P. Gislason

2010 ◽  
Author(s):  
Heinz-Christoph Neitzert ◽  
Manuela Ferrara ◽  
Wolfgang Fahrner ◽  
Maximilian Scherff ◽  
Arjen Klaver ◽  
...  

2012 ◽  
Vol 571 ◽  
pp. 125-128
Author(s):  
Li Min Liang ◽  
Xin Jian Xie ◽  
Qiu Yan Hao ◽  
Yuan Tian ◽  
Wei Zhong Sun ◽  
...  

The yellow luminescence (YL) band in unintentional doped n-GaN irradiated by 10 MeV electrons has been investigated by means of photoluminescence (PL) spectroscopy. The YL intensity increased after electron irradiation and thermal annealing, indicating that the deep level defects are created by electron irradiation and thermal annealing. These deep level point defect complexes arising from the irradiation introduced Ga vacancies and oxygen donor impurities are responsible for the YL.


Author(s):  
W. Kunath ◽  
E. Zeitler ◽  
M. Kessel

The features of digital recording of a continuous series (movie) of singleelectron TV frames are reported. The technique is used to investigate structural changes in negatively stained glutamine synthetase molecules (GS) during electron irradiation and, as an ultimate goal, to look for the molecules' “undamaged” structure, say, after a 1 e/Å2 dose.The TV frame of fig. la shows an image of 5 glutamine synthetase molecules exposed to 1/150 e/Å2. Every single electron is recorded as a unit signal in a 256 ×256 field. The extremely low exposure of a single TV frame as dictated by the single-electron recording device including the electron microscope requires accumulation of 150 TV frames into one frame (fig. lb) thus achieving a reasonable compromise between the conflicting aspects of exposure time per frame of 3 sec. vs. object drift of less than 1 Å, and exposure per frame of 1 e/Å2 vs. rate of structural damage.


Author(s):  
T. Mukai ◽  
T. E. Mitchell

Radiation-induced homogeneous precipitation in Ni-Be alloys was recently observed by high voltage electron microscopy. A coupling of interstitial flux with solute Be atoms is responsible for the precipitation. The present investigation further shows that precipitation is also induced at thin foil surfaces by electron irradiation under a high vacuum.


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