Calculation of vibrational lifetimes in amorphous silicon using molecular dynamics simulations

1998 ◽  
Vol 57 (19) ◽  
pp. 12234-12238 ◽  
Author(s):  
S. R. Bickham ◽  
J. L. Feldman
2002 ◽  
Vol 66 (19) ◽  
Author(s):  
V. I. Ivashchenko ◽  
P. E. A. Turchi ◽  
V. I. Shevchenko ◽  
L. A. Ivashchenko ◽  
G. V. Rusakov

1990 ◽  
Vol 192 ◽  
Author(s):  
R. Biswas ◽  
I. Kwon ◽  
C. M. Soukoulis

ABSTRACTAmorphous silicon models have been computer-generated by melt-quenching and film deposition molecular dynamics simulations, employing classical interatomic Si-potentials. The structural, vibrational and electronic properties of these models is described. Dangling-bond gap states are well localized whereas, floating bonds gap states are considerably less localized with wavefunction amplitudes on the neighbors of the five-coordinated atom. In contrast to melt-quenched models, the a-Si films displayed voids, a 15–28% lower density than c-Si, and no five- coordinated atoms. A-Si:H models with 5 and 22% hydrogen, and both monohydride and dihydride species, have also been developed.


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