Molecular Dynamics Simulations of the Structural, Vibrational and Electronic Properties of Amorphous Silicon

1990 ◽  
Vol 192 ◽  
Author(s):  
R. Biswas ◽  
I. Kwon ◽  
C. M. Soukoulis

ABSTRACTAmorphous silicon models have been computer-generated by melt-quenching and film deposition molecular dynamics simulations, employing classical interatomic Si-potentials. The structural, vibrational and electronic properties of these models is described. Dangling-bond gap states are well localized whereas, floating bonds gap states are considerably less localized with wavefunction amplitudes on the neighbors of the five-coordinated atom. In contrast to melt-quenched models, the a-Si films displayed voids, a 15–28% lower density than c-Si, and no five- coordinated atoms. A-Si:H models with 5 and 22% hydrogen, and both monohydride and dihydride species, have also been developed.

2018 ◽  
Vol 56 (3) ◽  
pp. 783-792 ◽  
Author(s):  
Cihan Kürkçü ◽  
Selgin AL ◽  
Ziya Merdan ◽  
Çağatay Yamçiçier ◽  
Hülya Öztürk

2001 ◽  
Vol 677 ◽  
Author(s):  
W. C. Liu ◽  
Y. X. Wang ◽  
C. H. Woo ◽  
Hanchen Huang

ABSTRACTIn this paper we present three-dimensional molecular dynamics simulations of dislocation nucleation and propagation during thin film deposition. Aiming to identify mechanisms of dislocation nucleation in polycrystalline thin films, we choose the film material to be the same as the substrate – which is stressed. Tungsten and aluminum are taken as representatives of BCC and FCC metals, respectively, in the molecular dynamics simulations. Our studies show that both glissile and sessile dislocations are nucleated during the deposition, and surface steps are preferential nucleation sites of dislocations. Further, the results indicate that dislocations nucleated on slip systems with large Schmid factors more likely survive and propagate into the film. When a glissile dislocation is nucleated, it propagates much faster horizontally than vertically into the film. The mechanisms and criteria of dislocation nucleation are essential to the implementation of the atomistic simulator ADEPT.


2018 ◽  
Vol 9 (3) ◽  
pp. 681-687 ◽  
Author(s):  
Wei-Tao Peng ◽  
B. Scott Fales ◽  
Yinan Shu ◽  
Benjamin G. Levine

The ultrafast dynamics of nonradiative recombination at dangling bond defects is elucidated by nanoscale multireference ab initio molecular dynamics simulations.


2002 ◽  
Vol 66 (19) ◽  
Author(s):  
V. I. Ivashchenko ◽  
P. E. A. Turchi ◽  
V. I. Shevchenko ◽  
L. A. Ivashchenko ◽  
G. V. Rusakov

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