Monte Carlo study of the low-temperature mobility of electrons in a strained Si layer grown on aSi1−xGexsubstrate

1994 ◽  
Vol 49 (3) ◽  
pp. 1875-1881 ◽  
Author(s):  
Toshishige Yamada ◽  
H. Miyata ◽  
J.-R. Zhou ◽  
D. K. Ferry
2019 ◽  
Vol 21 (27) ◽  
pp. 14964-14972 ◽  
Author(s):  
M. Yu. Lavrentiev ◽  
N. L. Allan ◽  
C. Wragg

Quantum corrections to unit cell parameters provide correct low-temperature limits and must be allowed for when comparing theory and experiment.


2003 ◽  
Vol 2 (2-4) ◽  
pp. 109-112 ◽  
Author(s):  
Hiroshi Nakatsuji ◽  
Yoshinari Kamakura ◽  
Kenji Taniguchi

VLSI Design ◽  
1998 ◽  
Vol 6 (1-4) ◽  
pp. 213-216
Author(s):  
Mahbub Rashed ◽  
W.-K. Shih ◽  
S. Jallepalli ◽  
R. Zaman ◽  
T. J. T. Kwan ◽  
...  

Electron transport in pseudomorphically-grown silicon on relaxed (001) Si1-xGex is investigated using a Monte Carlo (MC) simulation tool. The study includes both electron transport in bulk materials and in nMOS structures. The bulk MC simulator is based on a multiband analytical model, “fitted bands”, representing the features of a realistic energy bandstructure. The investigation includes the study of low- and high-field electron transport characteristics at 77 K and 300 K. Single particle MC simulations are performed for a strained silicon nMOS structure at room temperature. Both calculations show saturation of mobility enhancement in strained silicon beyond germanium mole fraction of 0.2.


1996 ◽  
Vol 06 (C3) ◽  
pp. C3-87-C3-92
Author(s):  
F. Gámiz ◽  
J. B. Roldán ◽  
J. A. López-Villanueva ◽  
J. E. Carceller ◽  
P. Cartujo

1993 ◽  
Vol 141 (1) ◽  
pp. 219-238 ◽  
Author(s):  
R.K. Herz ◽  
A. Badlani ◽  
D.R. Schryer ◽  
B.T. Upchurch

1988 ◽  
Vol 49 (C8) ◽  
pp. C8-1389-C8-1390
Author(s):  
Masako Takasu ◽  
Seiji Miyashita ◽  
Masuo Suzuki ◽  
Yasumasa Kanada

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