A Monte Carlo study ,of Electron Transport in Strained
Si/SiGe Heterostructures
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Electron transport in pseudomorphically-grown silicon on relaxed (001) Si1-xGex is investigated using a Monte Carlo (MC) simulation tool. The study includes both electron transport in bulk materials and in nMOS structures. The bulk MC simulator is based on a multiband analytical model, “fitted bands”, representing the features of a realistic energy bandstructure. The investigation includes the study of low- and high-field electron transport characteristics at 77 K and 300 K. Single particle MC simulations are performed for a strained silicon nMOS structure at room temperature. Both calculations show saturation of mobility enhancement in strained silicon beyond germanium mole fraction of 0.2.
2006 ◽
Vol 5
(2-3)
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pp. 79-83
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2007 ◽
Vol 4
(7)
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pp. 2695-2699
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2007 ◽
Vol 21
(04)
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pp. 199-206
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