Amorphous-crystalline boundary dynamics in cw laser crystallization

1982 ◽  
Vol 25 (6) ◽  
pp. 4002-4018 ◽  
Author(s):  
H. J. Zeiger ◽  
John C. C. Fan ◽  
B. J. Palm ◽  
R. L. Chapman ◽  
R. P. Gale
1983 ◽  
Vol 23 ◽  
Author(s):  
J.M. Hode ◽  
J.P. Joly ◽  
P. Jeuch

ABSTRACTWe present an overview of the thermal modeling of CW laser induced crystallization of SOI. The dynamical case for a three-layer structure is derived. Effects of the phase change (increase in reflectivity, latent heat) are also treated. Analytical expressions are given and the models are compared to experiment.


1991 ◽  
Vol 70 (8) ◽  
pp. 4637-4639 ◽  
Author(s):  
M. Ivanda ◽  
K. Furić ◽  
O. Gamulin ◽  
M. Peršin ◽  
D. Gracin

2003 ◽  
Vol 31 (1) ◽  
pp. 50-56
Author(s):  
Akito HARA ◽  
Fumiyo TAKEUCHI ◽  
Michiko TAKEI ◽  
Katsuyuki SUGA ◽  
Kenichi YOSHINO ◽  
...  

1980 ◽  
Vol 1 ◽  
Author(s):  
R. L. Chapman ◽  
John C. C. Fan ◽  
H. J. Zeiger ◽  
R. P. Gale

ABSTRACTTwo techniques have been used to measure the velocity of the amorphous-crystalline boundary during scanned laser crystallization of amorphous Ge films on fused-silica substrates. Values in the vicinity of 200 cm sec-1 have been measured by both methods. The results obtained by the first technique, an optical transmission method, confirm our theoretical model for the periodic motion of the boundary. The measurements made by the second technique, which is based on an examination of the structural features obtained at laser scanning rates up to about 600 cm sec-1 , show the boundary velocity to be rather insensitive to film thickness and background temperature. Controlled crystallization is expected to require stability of the laser beam power.


1983 ◽  
Vol 44 (C5) ◽  
pp. C5-343-C5-350 ◽  
Author(s):  
J. M. Hode ◽  
J. P. Joly

2004 ◽  
Vol 814 ◽  
Author(s):  
Seong Jin Park ◽  
Sang Hoon Kang ◽  
Yu Mi Ku ◽  
Jin Jang

AbstractWe have studied a CW laser crystallization (CLC) of various-shaped a-Si patterns on glass with changing scanning speed and laser power. The crystallized region inside the patterns showed 3 distinct regions, which is distinguished by their grain size; fine grains of several tens of nanometers near the edge of the pattern, very large grains over a few micrometers at the center of the pattern, so called Sequential Lateral Crystallization region and large grains about a micrometer or less between SLC and fine grain regions. This phenomenon is due to the formation of 2-D temperature gradient inside the pattern. One is the temperature gradient between the edge and center; the temperature of outer region is lower than that of inner region during or right after a CW laser scanning. The other is the temperature gradient along the scan direction; the temperature of starting region of a CW laser scanned area is lower than that of ending region. The former contributes mainly to make molten silicon area inside a pattern, and the latter induces lateral growth along the scan direction to make long grains in SLC region.


2004 ◽  
Vol 338-340 ◽  
pp. 758-761 ◽  
Author(s):  
A. Saboundji ◽  
T. Mohammed-Brahim ◽  
G. Andrä ◽  
J. Bergmann ◽  
F. Falk

2006 ◽  
Vol 511-512 ◽  
pp. 243-247 ◽  
Author(s):  
Seong Jin Park ◽  
Yu Mi Ku ◽  
Ki Hyung Kim ◽  
Eun Hyun Kim ◽  
Byung Kwon Choo ◽  
...  

1982 ◽  
Vol 11 (2) ◽  
pp. 303-320 ◽  
Author(s):  
I. D. Calder ◽  
K. L. Kavanagh ◽  
H. M. Naguib ◽  
C. Brassard ◽  
J. F. Currie ◽  
...  

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