scholarly journals Quantification of interfacial spin-charge conversion in hybrid devices with a metal/insulator interface

2020 ◽  
Vol 117 (14) ◽  
pp. 142405 ◽  
Author(s):  
Cristina Sanz-Fernández ◽  
Van Tuong Pham ◽  
Edurne Sagasta ◽  
Luis E. Hueso ◽  
Ilya V. Tokatly ◽  
...  
2011 ◽  
Vol 383-390 ◽  
pp. 5154-5157
Author(s):  
Qian Peng ◽  
Li Ren Zhou

This paper takes metal-insulator-metal system as example and investigates the main types of electrical contact through the view of energy band structure, to analyze the whole process of the transition from ohm contact to barrier contact. Ohm contact, which promotes charges injection from electrode (metal) to insulator, can be used as storage of charge carrier, which is body limited; it can also be regarded as a type of contact that forms an accumulation layer extending from the interface to the interior of the insulator. Whereas, barrier contact is a type of contact which forms a depletion region extending from the interface to the interior of insulator. As for this type of contact, electron injection from metal tends to the state of saturation. The characteristic of neutral contact is that there is no space charge in the insulator, nor band bending, which means the boundary of conduction band and valence band up to the interface is flat.


1984 ◽  
Vol 41 ◽  
Author(s):  
Michael Scheinfein ◽  
Michael Isaacson

AbstractUsing a 0.5 nm diameter probe of 100 keV electrons, we have been able to detect significant changes in the transmission electron energy loss spectra in the region of valence shell and L23 shell excitation within a spatial extent of 0.4 nm of an Al-AlF3 interface. The spectra have been recorded with a dose significantly less than the critical dose for destruction of the AlF3.


2012 ◽  
Vol 111 (7) ◽  
pp. 07C307 ◽  
Author(s):  
R. Takahashi ◽  
R. Iguchi ◽  
K. Ando ◽  
H. Nakayama ◽  
T. Yoshino ◽  
...  

2020 ◽  
Vol 22 (8) ◽  
pp. 433-437
Author(s):  
V.S. Belov ◽  
◽  

In this work has been developed a technology for obtaining nickel-insulator-aluminum structure with 7 nm thick tantalum oxide deposited by atomic-layer deposition. An asymmetric current-voltage characteristic of the structure is obtained, and the heights of potential barriers at the metal-insulator interface are determined. The permittivity of the tantalum oxide film has been determined experimentally in this work.


2005 ◽  
Vol 894 ◽  
Author(s):  
Michiko Yoshitake

AbstractThe potential of applying photoelectron spectroscopic and Kelvin probe methods for the interface potential evaluation of materials prepared by combinatorial processes is demonstrated. The physical basis for the evaluation of the interface potential by photoelectron spectroscopy is given. Then, the imaging capability of photoelectron spectroscopy is demonstrated using a two-dimensionally patterned specimen. Finally, the examples of interface potential evaluation with photoelectron spectroscopy and Kelvin probe are presented. Through the evaluation of interface potential with this method, it is possible to deduce the energy level diagram across the interface between two materials with different electron properties.


Sign in / Sign up

Export Citation Format

Share Document