Influence of light‐induced defects in hydrogenated amorphous silicon on charge carrier dynamics

1985 ◽  
Vol 46 (1) ◽  
pp. 69-70 ◽  
Author(s):  
A. Werner ◽  
M. Kunst
1983 ◽  
Vol 42 (10) ◽  
pp. 914-914
Author(s):  
Shuji Komuro ◽  
Yoshinobu Aoyagi ◽  
Yusaburo Segawa ◽  
Susumu Namba ◽  
Akio Masuyama ◽  
...  

1991 ◽  
pp. 265-268
Author(s):  
H. Labidi ◽  
K. Zellama ◽  
P. Germain ◽  
M. Astier ◽  
D. Lortigues ◽  
...  

1992 ◽  
Vol 258 ◽  
Author(s):  
Masao Isomura ◽  
Sigurd Wagner

ABSTRACTWe report a study of the rates of generation and of annealing of the light-induced defects in hydrogenated amorphous silicon (a-Si:H). The rates of generation are found to be sensitive to temperature when the light intensity is high. This increased sensitivity to temperature at high rates suggests that a temperature-activated process such as hydrogen motion controls the rates of generation more when they are high. The rate of annealing at 130°C is strongly accelerated by illumination, and depends strongly on the light intensity. This may be explained by the diffusion of hydrogen, accelerated by excess carriers.


1983 ◽  
Vol 42 (1) ◽  
pp. 79-81 ◽  
Author(s):  
Shuji Komuro ◽  
Yoshinobu Aoyagi ◽  
Yusaburo Segawa ◽  
Susumu Namba ◽  
Akio Masuyama ◽  
...  

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