Highly photoconductive and photosensitive hydrogenated amorphous silicon carbon alloy films prepared by magnetron sputtering

Nobuo Saito

doi:10.1063/1.95853

Highly photoconductive and photosensitive hydrogenated amorphous silicon carbon alloy films prepared by magnetron sputtering

Applied Physics Letters ◽

10.1063/1.95853 ◽

1985 ◽

Vol 46 (1) ◽

pp. 61-63 ◽

Cited By ~ 19

Author(s):

Nobuo Saito

Keyword(s):

Magnetron Sputtering ◽

Amorphous Silicon ◽

Hydrogenated Amorphous Silicon ◽

Alloy Films ◽

Silicon Carbon ◽

Hydrogenated Amorphous

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Influence of sputtering pressure on the properties of hydrogenated amorphous‐silicon carbon alloy films prepared by magnetron sputtering of silicon in methane‐argon gas mixtures

Journal of Applied Physics ◽

10.1063/1.336995 ◽

1986 ◽

Vol 59 (7) ◽

pp. 2498-2502 ◽

Cited By ~ 16

Author(s):

Nobuo Saito

Keyword(s):

Magnetron Sputtering ◽

Amorphous Silicon ◽

Hydrogenated Amorphous Silicon ◽

Gas Mixtures ◽

Argon Gas ◽

Alloy Films ◽

Silicon Carbon ◽

Sputtering Pressure ◽

Hydrogenated Amorphous

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Electron spin resonance of hydrogenated amorphous silicon-carbon alloy films prepared by magnetron sputtering

Philosophical Magazine Letters ◽

10.1080/09500838708203764 ◽

1987 ◽

Vol 56 (4) ◽

pp. 161-163 ◽

Cited By ~ 1

Author(s):

Takato Nakamura ◽

Nobuo Saito ◽

Yoshiko Suzuki ◽

Yoichiro Nakanishi ◽

Goro Shimaoka

Keyword(s):

Electron Spin Resonance ◽

Magnetron Sputtering ◽

Amorphous Silicon ◽

Electron Spin ◽

Hydrogenated Amorphous Silicon ◽

Alloy Films ◽

Silicon Carbon ◽

Spin Resonance ◽

Hydrogenated Amorphous

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Doping effects of aluminium on the properties of hydrogenated amorphous silicon–carbon alloy films prepared by magnetron sputtering

Philosophical Magazine B ◽

10.1080/13642819008215250 ◽

1990 ◽

Vol 62 (5) ◽

pp. 527-536 ◽

Cited By ~ 11

Author(s):

N. Saito ◽

Y. Tomioka ◽

H. Senda ◽

T. Yamaguchi ◽

K. Kawamura

Keyword(s):

Magnetron Sputtering ◽

Amorphous Silicon ◽

Hydrogenated Amorphous Silicon ◽

Alloy Films ◽

Silicon Carbon ◽

Doping Effects ◽

Hydrogenated Amorphous

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Influence of rf power on the properties of hydrogenated amorphous silicon carbon alloy films prepared by magnetron sputtering of silicon in methane‐argon gas mixtures

Journal of Applied Physics ◽

10.1063/1.335775 ◽

1985 ◽

Vol 58 (9) ◽

pp. 3504-3507 ◽

Cited By ~ 29

Author(s):

Nobuo Saito

Keyword(s):

Magnetron Sputtering ◽

Amorphous Silicon ◽

Hydrogenated Amorphous Silicon ◽

Gas Mixtures ◽

Rf Power ◽

Argon Gas ◽

Alloy Films ◽

Silicon Carbon ◽

Hydrogenated Amorphous

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Effect of hydrogen on the properties of magnetron sputtering of hydrogenated amorphous silicon carbon alloy films

Journal of Applied Physics ◽

10.1063/1.337844 ◽

1987 ◽

Vol 61 (8) ◽

pp. 2962-2965 ◽

Cited By ~ 7

Author(s):

Nobuo Saito

Keyword(s):

Magnetron Sputtering ◽

Amorphous Silicon ◽

Hydrogenated Amorphous Silicon ◽

Alloy Films ◽

Silicon Carbon ◽

Hydrogenated Amorphous

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Defects in hydrogenated amorphous silicon‐carbon alloy films prepared by glow discharge decomposition and sputtering

Journal of Applied Physics ◽

10.1063/1.329879 ◽

1982 ◽

Vol 53 (11) ◽

pp. 7299-7305 ◽

Cited By ~ 132

Author(s):

A. Morimoto ◽

T. Miura ◽

M. Kumeda ◽

T. Shimizu

Keyword(s):

Glow Discharge ◽

Amorphous Silicon ◽

Hydrogenated Amorphous Silicon ◽

Alloy Films ◽

Silicon Carbon ◽

Hydrogenated Amorphous

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The effect of carbon on the density of states of hydrogenated amorphous silicon-carbon alloy films prepared from silane and propane

Journal of Non-Crystalline Solids ◽

10.1016/0022-3093(89)90022-7 ◽

1989 ◽

Vol 113 (2-3) ◽

pp. 282-286 ◽

Cited By ~ 1

Author(s):

K. Ibrahim ◽

J.I.B. Wilson ◽

A. Qayyum ◽

A.E. Henderson ◽

A.G. Fitzgerald

Keyword(s):

Amorphous Silicon ◽

Density Of States ◽

Hydrogenated Amorphous Silicon ◽

Alloy Films ◽

Silicon Carbon ◽

Hydrogenated Amorphous

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Thermal modification of wide-bandgap hydrogenated amorphous silicon-carbon alloy films grown by plasma-enhanced chemical vapour deposition from C2H2+SiH4 mixtures

Philosophical Magazine B ◽

10.1080/13642819708202333 ◽

1997 ◽

Vol 75 (4) ◽

pp. 485-496 ◽

Cited By ~ 6

Author(s):

Yichun Liu ◽

F. Giorgis ◽

C. F. Pirri

Keyword(s):

Amorphous Silicon ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapour ◽

Wide Bandgap ◽

Thermal Modification ◽

Alloy Films ◽

Silicon Carbon ◽

Hydrogenated Amorphous

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Thermally induced metastable defects in hydrogenated amorphous silicon and silicon-carbon alloy films

Physical Review B ◽

10.1103/physrevb.38.8371 ◽

1988 ◽

Vol 38 (12) ◽

pp. 8371-8376 ◽

Cited By ~ 34

Author(s):

Xixiang Xu ◽

Akihisa Okumura ◽

Akiharu Morimoto ◽

Minoru Kumeda ◽

Tatsuo Shimizu

Keyword(s):

Amorphous Silicon ◽

Hydrogenated Amorphous Silicon ◽

Alloy Films ◽

Thermally Induced ◽

Silicon Carbon ◽

Hydrogenated Amorphous

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Quantum well model and variation of the optical band gap in hydrogenated amorphous silicon carbon alloy films

Solid State Communications ◽

10.1016/s0038-1098(01)00161-2 ◽

2001 ◽

Vol 118 (10) ◽

pp. 535-539 ◽

Cited By ~ 6

Author(s):

D.K Basa

Keyword(s):

Quantum Well ◽

Amorphous Silicon ◽

Band Gap ◽

Optical Band Gap ◽

Hydrogenated Amorphous Silicon ◽

Alloy Films ◽

Silicon Carbon ◽

Well Model ◽

Hydrogenated Amorphous

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