Influence of rf power on the properties of hydrogenated amorphous silicon carbon alloy films prepared by magnetron sputtering of silicon in methane‐argon gas mixtures

1985 ◽  
Vol 58 (9) ◽  
pp. 3504-3507 ◽  
Author(s):  
Nobuo Saito
Keyword(s):  
Magnetron Sputtering ◽  
Amorphous Silicon ◽  
Hydrogenated Amorphous Silicon ◽  
Gas Mixtures ◽  
Rf Power ◽  
Argon Gas ◽  
Alloy Films ◽  
Silicon Carbon ◽  
Hydrogenated Amorphous

Thermally induced metastable defects in hydrogenated amorphous silicon and silicon-carbon alloy films

1988 ◽  
Vol 38 (12) ◽  
pp. 8371-8376 ◽  
Author(s):  
Xixiang Xu ◽  
Akihisa Okumura ◽  
Akiharu Morimoto ◽  
Minoru Kumeda ◽  
Tatsuo Shimizu
Keyword(s):  
Amorphous Silicon ◽  
Hydrogenated Amorphous Silicon ◽  
Alloy Films ◽  
Thermally Induced ◽  
Silicon Carbon ◽  
Hydrogenated Amorphous
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