Thermally induced metastable defects in hydrogenated amorphous silicon and silicon-carbon alloy films

Xixiang Xu; Akihisa Okumura; Akiharu Morimoto; Minoru Kumeda; Tatsuo Shimizu

doi:10.1103/physrevb.38.8371

Thermally induced metastable defects in hydrogenated amorphous silicon and silicon-carbon alloy films

Physical Review B ◽

10.1103/physrevb.38.8371 ◽

1988 ◽

Vol 38 (12) ◽

pp. 8371-8376 ◽

Cited By ~ 34

Author(s):

Xixiang Xu ◽

Akihisa Okumura ◽

Akiharu Morimoto ◽

Minoru Kumeda ◽

Tatsuo Shimizu

Keyword(s):

Amorphous Silicon ◽

Hydrogenated Amorphous Silicon ◽

Alloy Films ◽

Thermally Induced ◽

Silicon Carbon ◽

Hydrogenated Amorphous

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Influence of sputtering pressure on the properties of hydrogenated amorphous‐silicon carbon alloy films prepared by magnetron sputtering of silicon in methane‐argon gas mixtures

Journal of Applied Physics ◽

10.1063/1.336995 ◽

1986 ◽

Vol 59 (7) ◽

pp. 2498-2502 ◽

Cited By ~ 16

Author(s):

Nobuo Saito

Keyword(s):

Magnetron Sputtering ◽

Amorphous Silicon ◽

Hydrogenated Amorphous Silicon ◽

Gas Mixtures ◽

Argon Gas ◽

Alloy Films ◽

Silicon Carbon ◽

Sputtering Pressure ◽

Hydrogenated Amorphous

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Defects in hydrogenated amorphous silicon‐carbon alloy films prepared by glow discharge decomposition and sputtering

Journal of Applied Physics ◽

10.1063/1.329879 ◽

1982 ◽

Vol 53 (11) ◽

pp. 7299-7305 ◽

Cited By ~ 132

Author(s):

A. Morimoto ◽

T. Miura ◽

M. Kumeda ◽

T. Shimizu

Keyword(s):

Glow Discharge ◽

Amorphous Silicon ◽

Hydrogenated Amorphous Silicon ◽

Alloy Films ◽

Silicon Carbon ◽

Hydrogenated Amorphous

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The effect of carbon on the density of states of hydrogenated amorphous silicon-carbon alloy films prepared from silane and propane

Journal of Non-Crystalline Solids ◽

10.1016/0022-3093(89)90022-7 ◽

1989 ◽

Vol 113 (2-3) ◽

pp. 282-286 ◽

Cited By ~ 1

Author(s):

K. Ibrahim ◽

J.I.B. Wilson ◽

A. Qayyum ◽

A.E. Henderson ◽

A.G. Fitzgerald

Keyword(s):

Amorphous Silicon ◽

Density Of States ◽

Hydrogenated Amorphous Silicon ◽

Alloy Films ◽

Silicon Carbon ◽

Hydrogenated Amorphous

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Thermal modification of wide-bandgap hydrogenated amorphous silicon-carbon alloy films grown by plasma-enhanced chemical vapour deposition from C2H2+SiH4 mixtures

Philosophical Magazine B ◽

10.1080/13642819708202333 ◽

1997 ◽

Vol 75 (4) ◽

pp. 485-496 ◽

Cited By ~ 6

Author(s):

Yichun Liu ◽

F. Giorgis ◽

C. F. Pirri

Keyword(s):

Amorphous Silicon ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapour ◽

Wide Bandgap ◽

Thermal Modification ◽

Alloy Films ◽

Silicon Carbon ◽

Hydrogenated Amorphous

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Quantum well model and variation of the optical band gap in hydrogenated amorphous silicon carbon alloy films

Solid State Communications ◽

10.1016/s0038-1098(01)00161-2 ◽

2001 ◽

Vol 118 (10) ◽

pp. 535-539 ◽

Cited By ~ 6

Author(s):

D.K Basa

Keyword(s):

Quantum Well ◽

Amorphous Silicon ◽

Band Gap ◽

Optical Band Gap ◽

Hydrogenated Amorphous Silicon ◽

Alloy Films ◽

Silicon Carbon ◽

Well Model ◽

Hydrogenated Amorphous

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Electron spin resonance of hydrogenated amorphous silicon-carbon alloy films prepared by magnetron sputtering

Philosophical Magazine Letters ◽

10.1080/09500838708203764 ◽

1987 ◽

Vol 56 (4) ◽

pp. 161-163 ◽

Cited By ~ 1

Author(s):

Takato Nakamura ◽

Nobuo Saito ◽

Yoshiko Suzuki ◽

Yoichiro Nakanishi ◽

Goro Shimaoka

Keyword(s):

Electron Spin Resonance ◽

Magnetron Sputtering ◽

Amorphous Silicon ◽

Electron Spin ◽

Hydrogenated Amorphous Silicon ◽

Alloy Films ◽

Silicon Carbon ◽

Spin Resonance ◽

Hydrogenated Amorphous

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Phosphorus Doping and Photoinduced Changes in Hydrogenated Amorphous Silicon-Carbon Alloy Films

Japanese Journal of Applied Physics ◽

10.1143/jjap.28.1776 ◽

1989 ◽

Vol 28 (Part 1, No. 10) ◽

pp. 1776-1779 ◽

Cited By ~ 7

Author(s):

N. Basu ◽

Gautam Ganguly ◽

Swati Ray ◽

A. K. Barua

Keyword(s):

Amorphous Silicon ◽

Hydrogenated Amorphous Silicon ◽

Phosphorus Doping ◽

Alloy Films ◽

Silicon Carbon ◽

Photoinduced Changes ◽

Hydrogenated Amorphous

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In situ electron spin resonance measurements of thermally induced metastable defects in doped hydrogenated amorphous silicon carbon films

Journal of Non-Crystalline Solids ◽

10.1016/0022-3093(89)90681-9 ◽

1989 ◽

Vol 114 ◽

pp. 657-659 ◽

Cited By ~ 2

Author(s):

Deyan He ◽

Fangqing Zhang ◽

Wei Chen ◽

Guanghua Chen

Keyword(s):

Electron Spin Resonance ◽

Amorphous Silicon ◽

Electron Spin ◽

Hydrogenated Amorphous Silicon ◽

Carbon Films ◽

Thermally Induced ◽

Silicon Carbon ◽

Spin Resonance ◽

Hydrogenated Amorphous

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Creation process of thermally induced defects in boron-doped hydrogenated amorphous silicon-carbon films

Philosophical Magazine B ◽

10.1080/13642819308207690 ◽

1993 ◽

Vol 67 (4) ◽

pp. 533-539 ◽

Cited By ~ 1

Author(s):

Guanghua Chen ◽

Zhizhong Song ◽

Liming Zhao ◽

Yongping Guo ◽

Fangqing Zhang

Keyword(s):

Amorphous Silicon ◽

Hydrogenated Amorphous Silicon ◽

Carbon Films ◽

Thermally Induced ◽

Creation Process ◽

Boron Doped ◽

Silicon Carbon ◽

Induced Defects ◽

Hydrogenated Amorphous

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Optical bandgap and quantum well model in hydrogenated amorphous silicon carbon alloy films

phys stat sol (a) ◽

10.1002/pssa.200306262 ◽

2003 ◽

Vol 195 (1) ◽

pp. 87-92 ◽

Cited By ~ 4

Author(s):

D.K. Basa

Keyword(s):

Quantum Well ◽

Amorphous Silicon ◽

Hydrogenated Amorphous Silicon ◽

Optical Bandgap ◽

Alloy Films ◽

Silicon Carbon ◽

Well Model ◽

Hydrogenated Amorphous

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