Electron energy distribution modification by RF bias in Ar/SF6 inductively coupled plasmas

2019 ◽  
Vol 115 (6) ◽  
pp. 064102 ◽  
Author(s):  
Hyo-Chang Lee ◽  
Chin-Wook Chung ◽  
J. H. Kim ◽  
D. J. Seong
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