Deposition of ZnO based thin films by atmospheric pressure spatial atomic layer deposition for application in solar cells

2017 ◽  
Vol 9 (2) ◽  
pp. 021203 ◽  
Author(s):  
Viet Huong Nguyen ◽  
João Resende ◽  
Carmen Jiménez ◽  
Jean-Luc Deschanvres ◽  
Perrine Carroy ◽  
...  
2020 ◽  
Vol 56 (89) ◽  
pp. 13752-13755
Author(s):  
Nils Boysen ◽  
Bujamin Misimi ◽  
Arbresha Muriqi ◽  
Jan-Lucas Wree ◽  
Tim Hasselmann ◽  
...  

This is the first report on a plasma enhanced spatial atomic layer deposition (APP-ALD) process at atmospheric pressure to grow conducting metallic Cu thin films from a carbene stabilized precursor.


2017 ◽  
Vol 5 (33) ◽  
pp. 8572-8578 ◽  
Author(s):  
Michael N. Getz ◽  
Per-Anders Hansen ◽  
Øystein S. Fjellvåg ◽  
Mohammed A. K. Ahmed ◽  
Helmer Fjellvåg ◽  
...  

Thin films of YVO4:Yb3+ exhibiting intense NIR emission have been deposited by atomic layer deposition. The NIR emission is attributed to a quantum splitting process that could be used to enhance the efficiency of solar cells.


APL Materials ◽  
2015 ◽  
Vol 3 (4) ◽  
pp. 040701 ◽  
Author(s):  
Robert L. Z. Hoye ◽  
David Muñoz-Rojas ◽  
Shelby F. Nelson ◽  
Andrea Illiberi ◽  
Paul Poodt ◽  
...  

2018 ◽  
Vol 57 (49) ◽  
pp. 16224-16227 ◽  
Author(s):  
Nils Boysen ◽  
Tim Hasselmann ◽  
Sarah Karle ◽  
Detlef Rogalla ◽  
Detlef Theirich ◽  
...  

Sign in / Sign up

Export Citation Format

Share Document