Effect of silane/hydrogen ratio on microcrystalline silicon thin films by remote inductively coupled plasma

Y. N. Guo; D. Y. Wei; S. Q. Xiao; S. Y. Huang; H. P. Zhou; S. Xu

doi:10.1063/1.4807404

Effect of silane/hydrogen ratio on microcrystalline silicon thin films by remote inductively coupled plasma

Journal of Applied Physics ◽

10.1063/1.4807404 ◽

2013 ◽

Vol 113 (20) ◽

pp. 203505 ◽

Cited By ~ 5

Author(s):

Y. N. Guo ◽

D. Y. Wei ◽

S. Q. Xiao ◽

S. Y. Huang ◽

H. P. Zhou ◽

...

Keyword(s):

Thin Films ◽

Inductively Coupled Plasma ◽

Microcrystalline Silicon ◽

Inductively Coupled ◽

Silicon Thin Films

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Plasma-Enhanced Reactive Magnetron Sputtering Assisted with Inductively Coupled Plasma for Reactivity-Controlled Deposition of Microcrystalline Silicon Thin Films

Japanese Journal of Applied Physics ◽

10.7567/jjap.52.11nb05 ◽

2013 ◽

Vol 52 (11S) ◽

pp. 11NB05 ◽

Cited By ~ 4

Author(s):

Kosuke Takenaka ◽

Yuichi Setsuhara ◽

Akinori Ebe

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Inductively Coupled Plasma ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Microcrystalline Silicon ◽

Inductively Coupled ◽

Silicon Thin Films ◽

Controlled Deposition

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Highly doped p-type microcrystalline silicon thin films fabricated by a low-frequency inductively coupled plasma at a low temperature

Journal of Physics D Applied Physics ◽

10.1088/0022-3727/44/34/345401 ◽

2011 ◽

Vol 44 (34) ◽

pp. 345401 ◽

Cited By ~ 4

Author(s):

W S Yan ◽

D Y Wei ◽

S Xu ◽

C C Sern ◽

H P Zhou

Keyword(s):

Thin Films ◽

Low Temperature ◽

Inductively Coupled Plasma ◽

Low Frequency ◽

Microcrystalline Silicon ◽

Inductively Coupled ◽

Silicon Thin Films ◽

P Type

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Preparation of Phosphorus Doped Hydrogenated Microcrystalline Silicon Thin Films by Inductively Coupled Plasma Chemical Vapor Deposition and Their Characteristics for Solar Cell Applications

Journal of Nanoscience and Nanotechnology ◽

10.1166/jnn.2008.1265 ◽

2008 ◽

Vol 8 (10) ◽

pp. 5521-5526 ◽

Cited By ~ 4

Author(s):

Chaehwan Jeong ◽

Seongjae Boo ◽

Tae-Won Kim ◽

Bum-Ho Choi ◽

Ho-Sung Kim ◽

...

Keyword(s):

Thin Films ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Microcrystalline Silicon ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled ◽

Silicon Thin Films ◽

Phosphorus Doped

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Device Relevant Doped Amorphous Silicon Thin Films by Inductively Coupled Plasma Enhanced Chemical Vapor Deposition

2018 IEEE 7th World Conference on Photovoltaic Energy Conversion (WCPEC) (A Joint Conference of 45th IEEE PVSC, 28th PVSEC & 34th EU PVSEC) ◽

10.1109/pvsc.2018.8548298 ◽

2018 ◽

Author(s):

Boon Heng TEO ◽

Jin LIU ◽

Jia GE ◽

Delio PEREZ ◽

Edwin CARMONA ◽

...

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Inductively Coupled ◽

Silicon Thin Films

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Nano-crystalline silicon thin films grown by the inductively coupled plasma assisted CFUBM at low temperature

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2010.07.086 ◽

2010 ◽

Vol 205 ◽

pp. S227-S230 ◽

Cited By ~ 6

Author(s):

Kyung S. Shin ◽

Yoon S. Choi ◽

In S. Choi ◽

Y. Setsuhara ◽

Jeon G. Han

Keyword(s):

Thin Films ◽

Low Temperature ◽

Inductively Coupled Plasma ◽

Crystalline Silicon ◽

Inductively Coupled ◽

Silicon Thin Films ◽

Nano Crystalline

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Highly doped p-type nanocrystalline silicon thin films fabricated by low-frequency inductively coupled plasma without H2 dilution

Journal of Applied Physics ◽

10.1063/1.3642983 ◽

2011 ◽

Vol 110 (6) ◽

pp. 063302 ◽

Cited By ~ 7

Author(s):

W. S. Yan ◽

D. Y. Wei ◽

S. Xu ◽

H. P. Zhou

Keyword(s):

Thin Films ◽

Inductively Coupled Plasma ◽

Low Frequency ◽

Nanocrystalline Silicon ◽

Inductively Coupled ◽

Silicon Thin Films ◽

P Type

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Enhanced Nucleation of Microcrystalline Silicon Thin Films Deposited by Inductively Coupled Plasma Chemical Vapor Deposition with Low-Frequency Pulse Substrate Bias

Japanese Journal of Applied Physics ◽

10.1143/jjap.49.050202 ◽

2010 ◽

Vol 49 (5) ◽

pp. 050202

Author(s):

Mamoru Furuta ◽

Takahiro Hiramatsu ◽

Takashi Hirao

Keyword(s):

Inductively Coupled Plasma ◽

Low Frequency ◽

Chemical Vapor ◽

Substrate Bias ◽

Microcrystalline Silicon ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled ◽

Silicon Thin Films ◽

Frequency Pulse

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Effects of substrate temperature on structural, optical and morphological properties of hydrogenated nanocrystalline silicon thin films prepared by inductively coupled plasma chemical vapor deposition

Journal of Materials Science Materials in Electronics ◽

10.1007/s10854-015-3426-0 ◽

2015 ◽

Vol 26 (10) ◽

pp. 7790-7796 ◽

Cited By ~ 2

Author(s):

Dingyu Yang ◽

Xinghua Zhu ◽

Hui Sun ◽

Xiuying Gao ◽

Xu Li

Keyword(s):

Thin Films ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Nanocrystalline Silicon ◽

Morphological Properties ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled ◽

Silicon Thin Films

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Hydrogenated poly-crystalline silicon thin films deposited by inductively coupled plasma assisted pulsed dc twin magnetron sputtering

Acta Physica Sinica ◽

10.7498/aps.61.028104 ◽

2012 ◽

Vol 61 (2) ◽

pp. 028104

Author(s):

Su Yuan-Jun ◽

Xu Jun ◽

Zhu Ming ◽

Fan Peng-Hui ◽

Dong Chuang

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Inductively Coupled Plasma ◽

Crystalline Silicon ◽

Inductively Coupled ◽

Silicon Thin Films ◽

Pulsed Dc

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Crystalline silicon surface passivation by intrinsic silicon thin films deposited by low-frequency inductively coupled plasma

Journal of Applied Physics ◽

10.1063/1.4733701 ◽

2012 ◽

Vol 112 (1) ◽

pp. 013708 ◽

Cited By ~ 26

Author(s):

H. P. Zhou ◽

D. Y. Wei ◽

S. Xu ◽

S. Q. Xiao ◽

L. X. Xu ◽

...

Keyword(s):

Thin Films ◽

Inductively Coupled Plasma ◽

Silicon Surface ◽

Surface Passivation ◽

Crystalline Silicon ◽

Low Frequency ◽

Inductively Coupled ◽

Silicon Thin Films ◽

Silicon Surface Passivation

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