Crystalline silicon surface passivation by intrinsic silicon thin films deposited by low-frequency inductively coupled plasma
2010 ◽
Vol 205
◽
pp. S227-S230
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Keyword(s):
Keyword(s):
2011 ◽
Vol 44
(34)
◽
pp. 345401
◽
Keyword(s):
Keyword(s):
Keyword(s):
2007 ◽
Vol 91
(2-3)
◽
pp. 174-179
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