Observation of Coulomb blockade and Coulomb staircase in a lateral metal nanostructure

2013 ◽  
Author(s):  
Sourabh Barua ◽  
Rohan Poojary ◽  
K. P. Rajeev
1992 ◽  
Vol 06 (05) ◽  
pp. 273-280 ◽  
Author(s):  
M.D. REEVE ◽  
O.G. SYMKO ◽  
R. LI

Tunneling studies between a Scanning Tunneling Microscope (STM)-controlled fine NbN tip and a NbN thin film show single electron tunneling characteristics at room temperature. The I-V curves display the Coulomb blockade and the Coulomb staircase caused by single electron charging of a series combination of two tunnel junctions. These room temperature observations indicate that it may be possible to operate single-electron-based devices in non-cryogenic regimes.


2017 ◽  
Vol 4 (2) ◽  
pp. 024004 ◽  
Author(s):  
Pipit Uky Vivitasari ◽  
Yasuo Azuma ◽  
Masanori Sakamoto ◽  
Toshiharu Teranishi ◽  
Yutaka Majima

2003 ◽  
Vol 776 ◽  
Author(s):  
Yasushi Takemura ◽  
Jun-ichi Shirakashi

AbstractIn a small magnetic tunnel junction (MTJ) whose charging energy is larger than a thermal energy, the tunnel magnetoresistance (TMR) is enhanced by the Coulomb blockade. Transport properties in a double MTJ were theoretically studied by using the Monte Carlo method. The temperature dependence of current-voltage and TMR characteristics indicated that a small junction with 5 nm electrodes exhibited the Coulomb blockade at 300 K. It was also found that the background charge changed the threshold voltage of the Coulomb blockade. In asymmetric double tunnel junctions, the current-voltage characteristic exhibited a Coulomb staircase and the voltage dependence of the TMR ratio oscillated.


2006 ◽  
Vol 958 ◽  
Author(s):  
Conrad R. Wolf ◽  
Andreas Ladenburger ◽  
Rainer Enchelmaier ◽  
Klaus Thonke ◽  
Rolf Sauer

ABSTRACTIn this paper we present a novel approach to fabricate single-electron devices utilizing different self-organization and self-alignment effects. Silicon quantum dots (QDs) are obtained employing reactive ion etching (RIE) into a silicon-on-insulator (SOI) substrate with a self-assembled etch mask. Electrodes with nanometer separation are fabricated and aligned to the QDs by means of a controlled electromigration process. The tunneling rates of the devices are defined by the native oxide covering the silicon QDs and can be adjusted by self-limiting thermal oxidation. The devices show clear Coulomb blockade behavior as well as Coulomb staircase features. In some samples also a gate influence is present giving rise to Coulomb diamonds in the differential conductance diagram.


1996 ◽  
Vol 14 (3) ◽  
pp. 1178-1183 ◽  
Author(s):  
R. P. Andres ◽  
S. Datta ◽  
M. Dorogi ◽  
J. Gomez ◽  
J. I. Henderson ◽  
...  

1999 ◽  
Vol 583 ◽  
Author(s):  
Jaehwan Oh ◽  
Hoon Ham ◽  
Peter Laloli ◽  
R. J. Nemanich

AbstractNanoscale TiSi2 islands are formed by electon beam deposition of a few monolayers of titanium followed by in situ annealing at high temperatures (800–1000°C). The typical island sizes were ˜10 nm. Electrical characteristics of these islands were probed using UHV-STM. I-V spectroscopies on these islands show single electron tunneling effects such as Coulomb blockade and Coulomb staircase at room temperature.


1999 ◽  
Vol 169 (4) ◽  
pp. 471 ◽  
Author(s):  
Z.D. Kvon ◽  
L.V. Litvin ◽  
V.A. Tkachenko ◽  
A.L. Aseev

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