Electrical Properties of Nanoscale Tisi2 Islands on Si
Keyword(s):
AbstractNanoscale TiSi2 islands are formed by electon beam deposition of a few monolayers of titanium followed by in situ annealing at high temperatures (800–1000°C). The typical island sizes were ˜10 nm. Electrical characteristics of these islands were probed using UHV-STM. I-V spectroscopies on these islands show single electron tunneling effects such as Coulomb blockade and Coulomb staircase at room temperature.
1992 ◽
Vol 06
(05)
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pp. 273-280
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1992 ◽
Vol 50
(2)
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pp. 1338-1339
Keyword(s):
1999 ◽
Vol 337
(1)
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pp. 317-320
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