Formation of arsenic rich silicon oxide under plasma immersion ion implantation and laser annealing
2005 ◽
Vol 237
(1-2)
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pp. 18-24
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2020 ◽
Vol 1695
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pp. 012009
2007 ◽
Vol 201
(15)
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pp. 6615-6618
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Keyword(s):
2007 ◽
Vol 50
(5-6)
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pp. 789-798
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