scholarly journals Surface reaction probability during fast deposition of hydrogenated amorphous silicon with a remote silane plasma

2000 ◽  
Vol 87 (7) ◽  
pp. 3313-3320 ◽  
Author(s):  
W. M. M. Kessels ◽  
M. C. M. van de Sanden ◽  
R. J. Severens ◽  
D. C. Schram
Keyword(s):  
Amorphous Silicon ◽  
Surface Reaction ◽  
Hydrogenated Amorphous Silicon ◽  
Reaction Probability ◽  
Hydrogenated Amorphous ◽  
Silane Plasma

Preparation of stable and photoconductive hydrogenated amorphous silicon from a Xe‐diluted silane plasma

1991 ◽  
Vol 58 (22) ◽  
pp. 2494-2496 ◽  
Author(s):  
A. Matsuda ◽  
S. Mashima ◽  
K. Hasezaki ◽  
A. Suzuki ◽  
S. Yamasaki ◽  
...  
Keyword(s):  
Amorphous Silicon ◽  
Hydrogenated Amorphous Silicon ◽  
Hydrogenated Amorphous ◽  
Silane Plasma

Growth of hydrogenated amorphous silicon due to controlled ion bombardment from a pure silane plasma

1983 ◽  
Vol 42 (9) ◽  
pp. 801-803 ◽  
Author(s):  
B. Drevillon ◽  
J. Perrin ◽  
J. M. Siefert ◽  
J. Huc ◽  
A. Lloret ◽  
...  
Keyword(s):  
Amorphous Silicon ◽  
Hydrogenated Amorphous Silicon ◽  
Ion Bombardment ◽  
Hydrogenated Amorphous ◽  
Silane Plasma

Lower-Temperature Growth of Hydrogenated Amorphous Silicon Films from Inductively Coupled Silane Plasma

1996 ◽  
Vol 35 (Part 2, No. 8A) ◽  
pp. L1009-L1011 ◽  
Author(s):  
Masashi Goto ◽  
Hirotaka Toyoda ◽  
Masatoshi Kitagawa ◽  
Takashi Hirao ◽  
Hideo Sugai
Keyword(s):  
Amorphous Silicon ◽  
Hydrogenated Amorphous Silicon ◽  
Silicon Films ◽  
Temperature Growth ◽  
Inductively Coupled ◽  
Lower Temperature ◽  
Hydrogenated Amorphous ◽  
Silane Plasma
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