Formation of cationic silicon clusters in a remote silane plasma and their contribution to hydrogenated amorphous silicon film growth

W. M. M. Kessels; C. M. Leewis; M. C. M. van de Sanden; D. C. Schram

doi:10.1063/1.371324

Formation of cationic silicon clusters in a remote silane plasma and their contribution to hydrogenated amorphous silicon film growth

Journal of Applied Physics ◽

10.1063/1.371324 ◽

1999 ◽

Vol 86 (7) ◽

pp. 4029-4039 ◽

Cited By ~ 66

Author(s):

W. M. M. Kessels ◽

C. M. Leewis ◽

M. C. M. van de Sanden ◽

D. C. Schram

Keyword(s):

Amorphous Silicon ◽

Film Growth ◽

Silicon Film ◽

Hydrogenated Amorphous Silicon ◽

Silicon Clusters ◽

Amorphous Silicon Film ◽

Hydrogenated Amorphous ◽

Silane Plasma

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Temperature dependence of the surface roughness evolution during hydrogenated amorphous silicon film growth

Applied Physics Letters ◽

10.1063/1.1543237 ◽

2003 ◽

Vol 82 (6) ◽

pp. 865-867 ◽

Cited By ~ 59

Author(s):

A. H. M. Smets ◽

W. M. M. Kessels ◽

M. C. M. van de Sanden

Keyword(s):

Surface Roughness ◽

Temperature Dependence ◽

Amorphous Silicon ◽

Film Growth ◽

Silicon Film ◽

Hydrogenated Amorphous Silicon ◽

Amorphous Silicon Film ◽

Hydrogenated Amorphous ◽

Surface Roughness Evolution

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Surface-diffusion-controlled incorporation of nanosized voids during hydrogenated amorphous silicon film growth

Applied Physics Letters ◽

10.1063/1.1853508 ◽

2005 ◽

Vol 86 (4) ◽

pp. 041909 ◽

Cited By ~ 20

Author(s):

A. H. M. Smets ◽

W. M. M. Kessels ◽

M. C. M. van de Sanden

Keyword(s):

Amorphous Silicon ◽

Surface Diffusion ◽

Film Growth ◽

Silicon Film ◽

Hydrogenated Amorphous Silicon ◽

Amorphous Silicon Film ◽

Diffusion Controlled ◽

Hydrogenated Amorphous

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3P-178 IRRAS Analysis on Composite Film of Dimyristoyl-Phosphatidylcoline and Bacteriorhodopsin on hydrogenated amorphous silicon film(Biol & Artifi memb.:Structure & Property,The 47th Annual Meeting of the Biophysical Society of Japan)

Seibutsu Butsuri ◽

10.2142/biophys.49.s181_4 ◽

2009 ◽

Vol 49 (supplement) ◽

pp. S181

Author(s):

Yutaka Tsujiuchi ◽

Hiroshi Masumoto ◽

Takashi Goto

Keyword(s):

Composite Film ◽

Amorphous Silicon ◽

Annual Meeting ◽

Silicon Film ◽

Hydrogenated Amorphous Silicon ◽

Structure Property ◽

Amorphous Silicon Film ◽

Biophysical Society ◽

Hydrogenated Amorphous

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Measurement of SiH2Densities in an RF-Discharge Silane Plasmae Used in the Chemical Vapor Deposition of Hydrogenated Amorphous Silicon Film

Japanese Journal of Applied Physics ◽

10.1143/jjap.31.2588 ◽

1992 ◽

Vol 31 (Part 1, No. 8) ◽

pp. 2588-2591 ◽

Cited By ~ 36

Author(s):

Kunihide Tachibana ◽

Tatsuru Shirafuji ◽

Yasuji Matsui

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Silicon Film ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Rf Discharge ◽

Amorphous Silicon Film ◽

Hydrogenated Amorphous

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Study on the mechanism of rapid solid-phase recrystallization of hydrogenated amorphous silicon film by rapid thermal processing

Thin Solid Films ◽

10.1016/j.tsf.2010.02.032 ◽

2010 ◽

Vol 518 (15) ◽

pp. 4473-4476 ◽

Cited By ~ 2

Author(s):

Xiaoyong Gao ◽

Hongliang Feng ◽

Qinggeng Lin ◽

Liwei Zhang ◽

Xuwei Liu ◽

...

Keyword(s):

Amorphous Silicon ◽

Thermal Processing ◽

Solid Phase ◽

Silicon Film ◽

Rapid Thermal Processing ◽

Hydrogenated Amorphous Silicon ◽

Phase Recrystallization ◽

Amorphous Silicon Film ◽

Hydrogenated Amorphous

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Effect of Ar+Ion Bombardment During Hydrogenated Amorphous Silicon Film Growth in Plasma Chemical Vapor Deposition System

Japanese Journal of Applied Physics ◽

10.1143/jjap.39.6404 ◽

2000 ◽

Vol 39 (Part 1, No. 11) ◽

pp. 6404-6409 ◽

Cited By ~ 4

Author(s):

Isamu Kato ◽

Yuuki Nakano ◽

Nobuhiko Yamaguchi

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Film Growth ◽

Silicon Film ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Amorphous Silicon Film ◽

Hydrogenated Amorphous

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3P247 Interfacial ion conductivity between acidic or neutral gels containing amino acid, and hydrogenated amorphous silicon film(Biol & Artifi memb.: Transport,The 48th Annual Meeting of the Biophysical Society of Japan)

Seibutsu Butsuri ◽

10.2142/biophys.50.s188_5 ◽

2010 ◽

Vol 50 (supplement2) ◽

pp. S188

Author(s):

Takaaki Ichikawa ◽

Takuya Takahashi ◽

Hiroshi Masumoto ◽

Takashi Goto ◽

Yutaka Tsujiuchi

Keyword(s):

Amino Acid ◽

Amorphous Silicon ◽

Annual Meeting ◽

Silicon Film ◽

Hydrogenated Amorphous Silicon ◽

Ion Conductivity ◽

Amorphous Silicon Film ◽

Biophysical Society ◽

Hydrogenated Amorphous

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3P223 Electric field effect on retinoid molecule film on hydrogenated amorphous silicon film(Biol & Artifi memb.: Structure & Property,The 48th Annual Meeting of the Biophysical Society of Japan)

Seibutsu Butsuri ◽

10.2142/biophys.50.s184_4 ◽

2010 ◽

Vol 50 (supplement2) ◽

pp. S184

Author(s):

Takuya Takahashi ◽

Hiroshi Masumoto ◽

Takashi Goto ◽

Yutaka Tsujiuchi

Keyword(s):

Electric Field ◽

Amorphous Silicon ◽

Field Effect ◽

Silicon Film ◽

Hydrogenated Amorphous Silicon ◽

Electric Field Effect ◽

Structure Property ◽

Amorphous Silicon Film ◽

Biophysical Society ◽

Hydrogenated Amorphous

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Crystallization of hydrogenated amorphous silicon film and its fractal structure

Vacuum ◽

10.1016/0042-207x(91)91263-n ◽

1991 ◽

Vol 42 (16) ◽

pp. 1039

Author(s):

Lin Hongyi ◽

Yang Daoming ◽

Li Yingxue

Keyword(s):

Amorphous Silicon ◽

Fractal Structure ◽

Silicon Film ◽

Hydrogenated Amorphous Silicon ◽

Amorphous Silicon Film ◽

Hydrogenated Amorphous

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A highly stabilized hydrogenated amorphous silicon film having very low hydrogen concentration and an improved Si bond network

Journal of Applied Physics ◽

10.1063/1.1846132 ◽

2005 ◽

Vol 97 (3) ◽

pp. 033522 ◽

Cited By ~ 47

Author(s):

Satoshi Shimizu ◽

Michio Kondo ◽

Akihisa Matsuda

Keyword(s):

Amorphous Silicon ◽

Hydrogen Concentration ◽

Silicon Film ◽

Hydrogenated Amorphous Silicon ◽

Amorphous Silicon Film ◽

Bond Network ◽

Hydrogenated Amorphous

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