Detection of defects in metal interconnects by the nonbias-optical beam induced current technique

Tohru Koyama; Kenichiro Sonoda; Junko Komori; Yoji Mashiko; Masataka Umeno

doi:10.1063/1.371638

Detection of defects in metal interconnects by the nonbias-optical beam induced current technique

Journal of Applied Physics ◽

10.1063/1.371638 ◽

1999 ◽

Vol 86 (11) ◽

pp. 5949-5956 ◽

Cited By ~ 4

Author(s):

Tohru Koyama ◽

Kenichiro Sonoda ◽

Junko Komori ◽

Yoji Mashiko ◽

Masataka Umeno

Keyword(s):

Optical Beam ◽

Induced Current ◽

Current Technique ◽

Metal Interconnects ◽

Optical Beam Induced Current ◽

Detection Of Defects

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Functional failure analysis on analog device by optical beam induced current technique

Proceedings of the 1997 6th International Symposium on the Physical and Failure Analysis of Integrated Circuits ◽

10.1109/ipfa.1997.638367 ◽

2002 ◽

Cited By ~ 2

Author(s):

K.T. Tan ◽

S.H. Tan ◽

S.H. Ong

Keyword(s):

Failure Analysis ◽

Optical Beam ◽

Induced Current ◽

Analog Device ◽

Functional Failure ◽

Current Technique ◽

Optical Beam Induced Current

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Electric field probing by incorporating Franz-Keldysh electroabsorption effect and optical-beam-induced-current technique

2005 IEEE LEOS Annual Meeting Conference Proceedings ◽

10.1109/leos.2005.1548293 ◽

2005 ◽

Author(s):

Wen-Chin Cheng ◽

Yi-Jen Chiu ◽

Fu-Jen Kao

Keyword(s):

Electric Field ◽

Optical Beam ◽

Induced Current ◽

Current Technique ◽

Optical Beam Induced Current

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Corrections to “Degradation Analysis of InP Buried Heterostructure Layers in Lasers Using Optical Beam Induced Current Technique” [Mar 10 142-148

IEEE Transactions on Device and Materials Reliability ◽

10.1109/tdmr.2010.2045922 ◽

2010 ◽

Vol 10 (2) ◽

pp. 301-301

Author(s):

Tatsuya Takeshita ◽

Tomonari Sato ◽

Manabu Mitsuhara ◽

Yasuhiro Kondo ◽

Hiromi Oohashi

Keyword(s):

Optical Beam ◽

Induced Current ◽

Current Technique ◽

Degradation Analysis ◽

Buried Heterostructure ◽

Optical Beam Induced Current

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Experimental and simulation results of optical beam induced current technique applied to wide bandgap semiconductors

Materials Science in Semiconductor Processing ◽

10.1016/j.mssp.2019.01.042 ◽

2019 ◽

Vol 94 ◽

pp. 116-127 ◽

Cited By ~ 1

Author(s):

Dominique Planson ◽

Besar Asllani ◽

Luong-Viet Phung ◽

Pascal Bevilacqua ◽

Hassan Hamad ◽

...

Keyword(s):

Wide Bandgap ◽

Optical Beam ◽

Induced Current ◽

Wide Bandgap Semiconductors ◽

Current Technique ◽

Simulation Results ◽

Bandgap Semiconductors ◽

Optical Beam Induced Current

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Degradation Analysis of 2-$\mu\hbox{m}$ DFB Laser Using Optical Beam-Induced Current Technique

IEEE Transactions on Electron Devices ◽

10.1109/ted.2007.904961 ◽

2007 ◽

Vol 54 (10) ◽

pp. 2644-2649 ◽

Cited By ~ 5

Author(s):

Tatsuya Takeshita ◽

Tomonari Sato ◽

Manabu Mitsuhara ◽

Yasuhiro Kondo ◽

Mitsuru Sugo ◽

...

Keyword(s):

Optical Beam ◽

Induced Current ◽

Current Technique ◽

Degradation Analysis ◽

Dfb Laser ◽

Optical Beam Induced Current

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Degradation Analysis of InP Buried Heterostructure Layers in Lasers Using Optical-Beam-Induced-Current Technique

IEEE Transactions on Device and Materials Reliability ◽

10.1109/tdmr.2009.2025490 ◽

2010 ◽

Vol 10 (1) ◽

pp. 142-148 ◽

Cited By ~ 4

Author(s):

T. Takeshita ◽

T. Sato ◽

M. Mitsuhara ◽

Y. Kondo ◽

H. Oohashi

Keyword(s):

Optical Beam ◽

Induced Current ◽

Current Technique ◽

Degradation Analysis ◽

Buried Heterostructure ◽

Optical Beam Induced Current

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Erratum to “Degradation Analysis of 2 $\mu$m DFB Laser Using Optical Beam Induced Current Technique” [Oct 07 2644-2649]

IEEE Transactions on Electron Devices ◽

10.1109/ted.2007.912944 ◽

2008 ◽

Vol 55 (2) ◽

pp. 701-701

Author(s):

Tatsuya Takeshita ◽

Tomonari Sato ◽

Manabu Mitsuhara ◽

Yasuhiro Kondo ◽

Mitsuru Sugo ◽

...

Keyword(s):

Optical Beam ◽

Induced Current ◽

Current Technique ◽

Degradation Analysis ◽

Dfb Laser ◽

Optical Beam Induced Current

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Evaluation of Silicide Morphology by Near-Infrared-Laser Optical-Beam-Induced-Current Technique

Japanese Journal of Applied Physics ◽

10.1143/jjap.40.6446 ◽

2001 ◽

Vol 40 (Part 1, No. 11) ◽

pp. 6446-6452 ◽

Cited By ~ 2

Author(s):

Tohru Koyama ◽

Masataka Umeno ◽

Junko Komori ◽

Yoji Mashiko

Keyword(s):

Near Infrared ◽

Infrared Laser ◽

Optical Beam ◽

Induced Current ◽

Current Technique ◽

Optical Beam Induced Current

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Nanometer scale studies of defects in semiconductor films by near-field optical beam induced current (NOBIC)

Defect Recognition and Image Processing in Semiconductors 1997 ◽

10.1201/9781315140810-6 ◽

2017 ◽

pp. 27-36

Author(s):

Julia W. P. Hsu ◽

M. H. Gray ◽

Q. Xu

Keyword(s):

Near Field ◽

Optical Beam ◽

Nanometer Scale ◽

Induced Current ◽

Semiconductor Films ◽

Optical Beam Induced Current

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Interest of Using a Micro-Meter Spatial Resolution to Study SiC Semi-Conductor Devices by Optical Beam Induced Current (OBIC)

Materials Science Forum ◽

10.4028/www.scientific.net/msf.1004.290 ◽

2020 ◽

Vol 1004 ◽

pp. 290-298

Author(s):

Camille Sonneville ◽

Dominique Planson ◽

Luong Viet Phung ◽

Pascal Bevilacqua ◽

Besar Asllani

Keyword(s):

Band Gap ◽

Spatial Resolution ◽

High Voltage ◽

Test Bench ◽

Wide Band ◽

Optical Beam ◽

Induced Current ◽

Wide Band Gap ◽

Optical Beam Induced Current

In this paper we present a new test bench called micro-OBIC used to characterized wide band gap semi-conductor. Micro-OBIC allows to get an Optical Beam Induced Current (OBIC) signal with a microscopic spatial resolution. We used micro-OBIC to characterize peripheral protection such as MESA, JTE or JTE in high voltage SiC device.

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