Deep level analysis of radiation-induced defects in Si crystals and solar cells

1999 ◽  
Vol 86 (1) ◽  
pp. 217-223 ◽  
Author(s):  
Masafumi Yamaguchi ◽  
Aurangzeb Khan ◽  
Stephen J. Taylor ◽  
Koshi Ando ◽  
Tsutomu Yamaguchi ◽  
...  
Author(s):  
Masafumi Yamaguchi ◽  
Takefumi Kamioka ◽  
Nobuaki Kojima ◽  
Yoshio Ohshita

2001 ◽  
Vol 90 (3) ◽  
pp. 1170-1178 ◽  
Author(s):  
Aurangzeb Khan ◽  
Masafumi Yamaguchi ◽  
Y. Ohshita ◽  
N. Dharmarasu ◽  
K. Araki ◽  
...  

2007 ◽  
Vol 131-133 ◽  
pp. 363-368 ◽  
Author(s):  
Vladimir P. Markevich ◽  
Anthony R. Peaker ◽  
I.F. Medvedeva ◽  
Vasilii E. Gusakov ◽  
L.I. Murin ◽  
...  

The influence of Cu contamination on radiation-induced defect reactions in n-type Czochralski-grown silicon (Cz-Si) crystals has been studied by means of the Hall effect technique, deep level transient spectroscopy (DLTS) and high-resolution Laplace DLTS with supporting theoretical modeling of defects. It is found that the contamination of Cz-Si samples with Cu does not influence significantly the energy spectrum and introduction rates of the principal electrically active defects induced by electron irradiation. The vacancy-oxygen (VO) centre, divacancy (V2) and a complex consisting of a silicon self-interstitial with the oxygen dimer (IO2) are found to be the dominant radiation-induced defects in Cu-contaminated samples as well as in uncontaminated ones. An isochronal annealing study has shown that the presence of Cu affects the annealing behaviour of the vacancy-related defects. In Cu-doped samples the VO centre disappears upon annealing at significantly lower temperatures (175-250°C) compared to those of the VO disappearance in the uncontaminated samples (300-375°C). The disappearance of the VO centres in the Cu-doped samples occurs simultaneously with an anti-correlated introduction of a defect with an energy level at about Ec- 0.60 eV. It is suggested that this defect is formed by the interaction of a mobile Cu atom with the VO complex. According to results of quantum-chemical modelling, in the most stable configuration of the Cu-VO defect a Cu atom occupies a tetrahedral interstitial position nearest to the elongated Si-Si bond of the VO centre. The presence of the Cu atom is found to result in the further elongation of the Si-Si bond and a shift of the VO acceptor level to the middle of the gap. The annealing behaviour of V2 has also been found to be different in the irradiated Cu-doped samples compared to that in the uncontaminated ones. The most probable reason for this difference is an interaction of mobile Cu atoms with di-vacancies. An energy level at about Ec-0.17 eV has been tentatively assigned to a complex consisting of a Cu atom and a di-vacancy.


2011 ◽  
Author(s):  
Robert J. Walters ◽  
Scott Messenger ◽  
Jeffrey H. Warner ◽  
Cory D. Cress ◽  
Maria Gonzalez ◽  
...  

Author(s):  
Hae-seok Lee ◽  
Masafumi Yamaguchi ◽  
Nicholas J. Ekins-daukes ◽  
Aurangzeb Khan ◽  
Tatsuya Takamoto ◽  
...  

2005 ◽  
Vol 483-485 ◽  
pp. 365-368 ◽  
Author(s):  
Giovanni Alfieri ◽  
Edouard V. Monakhov ◽  
Margareta K. Linnarsson ◽  
Bengt Gunnar Svensson

Deep level transient spectroscopy (DLTS) was employed to investigate the annealing behaviour and thermal stability of radiation induced defects in nitrogen doped 4H-SiC epitaxial layers, grown by chemical vapor deposition (CVD). The epilayers have been irradiated with 15 MeV electrons and an isochronal annealing series has been carried out. The measurements have been performed after each annealing step and six electron traps located in the energy band gap range of 0.42-1.6 eV below the conduction band edge (Ec) have been detected.


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