An Analysis of Electron Direct Tunneling Current through a High-K MOS Capacitor by Including the Effect of a Trap between HfO[sub 2] and SiO[sub 2] Interfaces
Keyword(s):
High K
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2004 ◽
Vol 48
(10-11)
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pp. 1801-1807
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2011 ◽
Vol 32
(4)
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pp. 569-571
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2003 ◽
Vol 125
(3-4)
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pp. 219-223
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Keyword(s):
2011 ◽
Vol 42
(5)
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pp. 688-692
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Keyword(s):
2004 ◽
Vol 3
(3-4)
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pp. 439-442
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Keyword(s):
2006 ◽
Vol 50
(2)
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pp. 170-176
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Keyword(s):
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