Conduction mechanism and origin of stress‐induced leakage current in thin silicon dioxide films

1996 ◽  
Vol 80 (11) ◽  
pp. 6360-6369 ◽  
Author(s):  
Mikihiro Kimura ◽  
Tadahiro Ohmi
Keyword(s):  
Silicon Dioxide ◽  
Leakage Current ◽  
Conduction Mechanism ◽  
Silicon Dioxide Films ◽  
Thin Silicon ◽  
Stress Induced Leakage Current

A hot hole-induced low-level leakage current in thin silicon dioxide films

1996 ◽  
Vol 43 (11) ◽  
pp. 1924-1929 ◽  
Author(s):  
N. Matsukawa ◽  
S. Yamada ◽  
K. Amemiya ◽  
H. Hazama
Keyword(s):  
Silicon Dioxide ◽  
Leakage Current ◽  
Low Level ◽  
Silicon Dioxide Films ◽  
Thin Silicon

Measurements and Modelling of Thin Silicon Dioxide Films on Silicon

1989 ◽  
Author(s):  
A. Kalnitsky ◽  
S. P. Tay ◽  
J. P. Ellul ◽  
J. W. Andrews ◽  
E. A. Irene ◽  
...  
Keyword(s):  
Silicon Dioxide ◽  
Silicon Dioxide Films ◽  
Thin Silicon
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