A hot hole-induced low-level leakage current in thin silicon dioxide films

N. Matsukawa; S. Yamada; K. Amemiya; H. Hazama

doi:10.1109/16.543028

A hot hole-induced low-level leakage current in thin silicon dioxide films

IEEE Transactions on Electron Devices ◽

10.1109/16.543028 ◽

1996 ◽

Vol 43 (11) ◽

pp. 1924-1929 ◽

Cited By ~ 28

Author(s):

N. Matsukawa ◽

S. Yamada ◽

K. Amemiya ◽

H. Hazama

Keyword(s):

Silicon Dioxide ◽

Leakage Current ◽

Low Level ◽

Silicon Dioxide Films ◽

Thin Silicon

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Influence of trapped charges on low-level leakage current in thin silicon dioxide films

2001 6th International Conference on Solid-State and Integrated Circuit Technology. Proceedings (Cat. No.01EX443) ◽

10.1109/icsict.2001.982058 ◽

2005 ◽

Cited By ~ 1

Author(s):

T.P. Chen ◽

Y.L. Luo

Keyword(s):

Silicon Dioxide ◽

Leakage Current ◽

Low Level ◽

Silicon Dioxide Films ◽

Thin Silicon

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A Hot Carrier Induced Low-Level Leakage Current in Thin Silicon Dioxide Films

33rd IEEE International Reliability Physics Symposium ◽

10.1109/irps.1995.363351 ◽

1995 ◽

Author(s):

N. Matsukawa ◽

S. Yamada ◽

K. Amemiya ◽

H. Hazama

Keyword(s):

Silicon Dioxide ◽

Leakage Current ◽

Hot Carrier ◽

Low Level ◽

Silicon Dioxide Films ◽

Thin Silicon

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A hot carrier induced low-level leakage current in thin silicon dioxide films

33rd IEEE International Reliability Physics Symposium ◽

10.1109/relphy.1995.513670 ◽

1995 ◽

Cited By ~ 8

Author(s):

N. Matsukawa ◽

S. Yamada ◽

K. Amemiya ◽

H. Hazama

Keyword(s):

Silicon Dioxide ◽

Leakage Current ◽

Hot Carrier ◽

Low Level ◽

Silicon Dioxide Films ◽

Thin Silicon

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Leakage current conduction and reliability assessment of passivating thin silicon dioxide films on n-4H-SiC

10.1117/12.2238875 ◽

2016 ◽

Cited By ~ 2

Author(s):

Piyas Samanta ◽

Krishna C. Mandal

Keyword(s):

Silicon Dioxide ◽

Leakage Current ◽

Reliability Assessment ◽

Silicon Dioxide Films ◽

Current Conduction ◽

Thin Silicon

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Charging And Intrinsic-leakage Current Peaks In Thin Silicon-dioxide Films

Symposium on VLSI Technology ◽

10.1109/vlsit.1997.623741 ◽

1997 ◽

Cited By ~ 6

Author(s):

Yamada ◽

Yugami ◽

Ohkura

Keyword(s):

Silicon Dioxide ◽

Leakage Current ◽

Silicon Dioxide Films ◽

Thin Silicon

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Conduction mechanism and origin of stress‐induced leakage current in thin silicon dioxide films

Journal of Applied Physics ◽

10.1063/1.363655 ◽

1996 ◽

Vol 80 (11) ◽

pp. 6360-6369 ◽

Cited By ~ 53

Author(s):

Mikihiro Kimura ◽

Tadahiro Ohmi

Keyword(s):

Silicon Dioxide ◽

Leakage Current ◽

Conduction Mechanism ◽

Silicon Dioxide Films ◽

Thin Silicon ◽

Stress Induced Leakage Current

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A Two-Step Tunneling Model for the Stress Induced Leakage Current in Thin Silicon Dioxide Films

10.7567/ssdm.1993.a-4-5 ◽

1993 ◽

Cited By ~ 1

Author(s):

Naoki Yasuda ◽

Nalin Patel ◽

Akira Toriumi

Keyword(s):

Silicon Dioxide ◽

Leakage Current ◽

Tunneling Model ◽

Silicon Dioxide Films ◽

Thin Silicon ◽

Stress Induced Leakage Current

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Measurements and Modelling of Thin Silicon Dioxide Films on Silicon

10.21236/ada207853 ◽

1989 ◽

Author(s):

A. Kalnitsky ◽

S. P. Tay ◽

J. P. Ellul ◽

J. W. Andrews ◽

E. A. Irene ◽

...

Keyword(s):

Silicon Dioxide ◽

Silicon Dioxide Films ◽

Thin Silicon

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Ultra-thin silicon dioxide leakage current and scaling limit

1992 Symposium on VLSI Technology Digest of Technical Papers ◽

10.1109/vlsit.1992.200622 ◽

2003 ◽

Cited By ~ 67

Author(s):

K.F. Schuegraf ◽

C.C. King ◽

C. Hu

Keyword(s):

Silicon Dioxide ◽

Leakage Current ◽

Scaling Limit ◽

Thin Silicon

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Gas Permeation Study and Imperfection Detection of Thermally Grown and Deposited Thin Silicon Dioxide Films

Journal of The Electrochemical Society ◽

10.1149/1.2425375 ◽

1962 ◽

Vol 109 (3) ◽

pp. 221 ◽

Cited By ~ 36

Author(s):

S. W. Ing ◽

R. E. Morrison ◽

J. E. Sandor

Keyword(s):

Silicon Dioxide ◽

Gas Permeation ◽

Silicon Dioxide Films ◽

Permeation Study ◽

Thin Silicon ◽

Thermally Grown

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