Electrical characterization of rapid thermal annealed radio frequency sputtered silicon oxide films

1996 ◽  
Vol 80 (10) ◽  
pp. 5837-5842 ◽  
Author(s):  
W. K. Choi ◽  
C. K. Choo ◽  
Y. F. Lu
Keyword(s):  
Radio Frequency ◽  
Silicon Oxide ◽  
Oxide Films ◽  
Electrical Characterization

Electrical characterization of hydrogenated amorphous silicon oxide films

2015 ◽  
Vol 54 (8S1) ◽  
pp. 08KB11 ◽  
Author(s):  
Takashi Itoh ◽  
Ryuichi Katayama ◽  
Koki Yamakawa ◽  
Kento Matsui ◽  
Masaru Saito ◽  
...  
Keyword(s):  
Amorphous Silicon ◽  
Silicon Oxide ◽  
Oxide Films ◽  
Hydrogenated Amorphous Silicon ◽  
Electrical Characterization ◽  
Amorphous Silicon Oxide ◽  
Hydrogenated Amorphous

Growth Rate and Characterization of Silicon Oxide Films Grown in  N 2 O  Atmosphere in a Rapid Thermal Processor

1994 ◽  
Vol 141 (1) ◽  
pp. 259-263 ◽  
Author(s):  
P. Lange ◽  
H. Bernt ◽  
E. Hartmannsgruber ◽  
F. Naumann
Keyword(s):  
Growth Rate ◽  
Silicon Oxide ◽  
Oxide Films

Plasma-assisted chemical vapor deposition and characterization of high quality silicon oxide films

1990 ◽  
Vol 193-194 ◽  
pp. 595-609 ◽  
Author(s):  
S.V Nguyen ◽  
D Dobuzinsky ◽  
D Dopp ◽  
R Gleason ◽  
M Gibson ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Silicon Oxide ◽  
Oxide Films ◽  
Chemical Vapor ◽  
High Quality

Deposition and electrical characterization of hafnium oxide films on silicon

2008 ◽  
Vol 5 (12) ◽  
pp. 3720-3723 ◽  
Author(s):  
E. Verrelli ◽  
D. Tsoukalas ◽  
D. Kouvatsos
Keyword(s):  
Hafnium Oxide ◽  
Oxide Films ◽  
Electrical Characterization
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