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2011 ◽  
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Author(s):  
Rajitha N. P. Vemuri ◽  
Mandar J. Gadre ◽  
N. D. Theodore ◽  
W. Chen ◽  
S. S. Lau ◽  
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Dopant Activation ◽  
Microwave Annealing

Dopant Activation in Single-Crystalline Germanium by Low-Temperature Microwave Annealing

2011 ◽  
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pp. 194-196 ◽  
Author(s):  
Yao-Jen Lee ◽  
Shang-Shiun Chuang ◽  
Fu-Kuo Hsueh ◽  
Ho-Ming Lin ◽  
Shich-Chuang Wu ◽  
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Low Temperature ◽  
Single Crystalline ◽  
Dopant Activation ◽  
Microwave Annealing ◽  
Crystalline Germanium

Low-Temperature Microwave Annealing Process for Dopant Activation and Thermal Stability of TiN Material

2012 ◽  
Vol 15 (6) ◽  
pp. H185
Author(s):  
Bo-An Tsai ◽  
Chiung-Hui Lai ◽  
Bo-Shiun Lee ◽  
Chih-Wei Luo ◽  
Yao-Jen Lee
Keyword(s):  
Thermal Stability ◽  
Low Temperature ◽  
Annealing Process ◽  
Dopant Activation ◽  
Microwave Annealing ◽  
Thermal Stability Of

Effective dopant activation by susceptor-assisted microwave annealing of low energy boron implanted and phosphorus implanted silicon

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Author(s):  
Zhao Zhao ◽  
N. David Theodore ◽  
Rajitha N. P. Vemuri ◽  
Wei Lu ◽  
S. S. Lau ◽  
...  
Keyword(s):  
Low Energy ◽  
Dopant Activation ◽  
Microwave Annealing ◽  
Effective Dopant

Effective dopant activation via low temperature microwave annealing of ion implanted silicon

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pp. 192103 ◽  
Author(s):  
Zhao Zhao ◽  
N. David Theodore ◽  
Rajitha N. P. Vemuri ◽  
Sayantan Das ◽  
Wei Lu ◽  
...  
Keyword(s):  
Low Temperature ◽  
Dopant Activation ◽  
Microwave Annealing ◽  
Effective Dopant ◽  
Ion Implanted
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