Purification of diamond films by applying current into the plasma stream in the arc discharge plasma jet chemical vapor deposition technique

Nobuei Ito; Minoru Yamamoto; Satoshi Nakamura; Tadashi Hattori

doi:10.1063/1.359074

Purification of diamond films by applying current into the plasma stream in the arc discharge plasma jet chemical vapor deposition technique

Journal of Applied Physics ◽

10.1063/1.359074 ◽

1995 ◽

Vol 77 (12) ◽

pp. 6636-6640 ◽

Cited By ~ 5

Author(s):

Nobuei Ito ◽

Minoru Yamamoto ◽

Satoshi Nakamura ◽

Tadashi Hattori

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Discharge Plasma ◽

Arc Discharge ◽

Diamond Films ◽

Chemical Vapor ◽

Plasma Jet ◽

Plasma Stream ◽

Deposition Technique ◽

Vapor Deposition Technique

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Effects of electrode arrangement and pressure on synthesis of diamond films by arc discharge plasma jet chemical vapor deposition

Diamond and Related Materials ◽

10.1016/0925-9635(95)00324-x ◽

1995 ◽

Vol 4 (12) ◽

pp. 1363-1370 ◽

Cited By ~ 6

Author(s):

Atsushi Hirata ◽

Masanori Yoshikawa

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Discharge Plasma ◽

Arc Discharge ◽

Diamond Films ◽

Chemical Vapor ◽

Plasma Jet ◽

Electrode Arrangement

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Growth of Nitrogen-Incorporated Diamond Films Using Hot-Filament Chemical Vapor Deposition Technique

Advanced Science Letters ◽

10.1166/asl.2013.4661 ◽

2013 ◽

Vol 19 (1) ◽

pp. 291-295 ◽

Cited By ~ 3

Author(s):

Mahtab Ullah ◽

E. Ahmed ◽

Ken Welch ◽

Saman Majdi ◽

N. R. Khalid ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Diamond Films ◽

Chemical Vapor ◽

Deposition Technique ◽

Chemical Vapor Deposition Technique ◽

Vapor Deposition Technique ◽

Hot Filament

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ChemInform Abstract: Diamond Film Preparation by Arc Discharge Plasma Jet Chemical Vapor Deposition in the Methane Atmosphere.

ChemInform ◽

10.1002/chin.199019028 ◽

1990 ◽

Vol 21 (19) ◽

Author(s):

N. OHTAKE ◽

M. YOSHIKAWA

Keyword(s):

Chemical Vapor Deposition ◽

Diamond Film ◽

Vapor Deposition ◽

Discharge Plasma ◽

Arc Discharge ◽

Chemical Vapor ◽

Plasma Jet ◽

Film Preparation

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Effects of Oxygen Addition on Growth of Diamond Film by Arc Discharge Plasma Jet Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.32.2067 ◽

1993 ◽

Vol 32 (Part 1, No. 5A) ◽

pp. 2067-2073 ◽

Cited By ~ 12

Author(s):

Naoto Ohtake ◽

Masanori Yoshikawa

Keyword(s):

Chemical Vapor Deposition ◽

Diamond Film ◽

Vapor Deposition ◽

Discharge Plasma ◽

Arc Discharge ◽

Chemical Vapor ◽

Plasma Jet ◽

Oxygen Addition

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Properties of diamond films grown from CH4CF4H2 gas mixture using the hot-filament chemical vapor deposition technique

Thin Solid Films ◽

10.1016/s0040-6090(02)00994-x ◽

2002 ◽

Vol 422 (1-2) ◽

pp. 20-27 ◽

Cited By ~ 2

Author(s):

D.V Musale ◽

N.R Pavaskar ◽

S.T Kshirsagar

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Diamond Films ◽

Chemical Vapor ◽

Gas Mixture ◽

Deposition Technique ◽

Chemical Vapor Deposition Technique ◽

Vapor Deposition Technique ◽

Hot Filament

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Comparative study of diamond films grown on silicon substrate using microwave plasma chemical vapor deposition and hot-filament chemical vapor deposition technique

Korean Journal of Chemical Engineering ◽

10.1007/bf02705797 ◽

2005 ◽

Vol 22 (5) ◽

pp. 770-773 ◽

Cited By ~ 3

Author(s):

Mushtaq Ahmad Dar ◽

Young-Soon Kim ◽

Shafeeque G. Ansari ◽

Hyung-il Kim ◽

Gilson Khang ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Plasma ◽

Diamond Films ◽

Chemical Vapor ◽

Deposition Technique ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Vapor Deposition Technique ◽

Hot Filament

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Selected-area Deposition of Diamond Films on Silicon Nitride-coated Silicon Substrates Using Negatively Biased Microwave Plasma Enhanced Chemical Vapor Deposition Technique

Japanese Journal of Applied Physics ◽

10.1143/jjap.36.6900 ◽

1997 ◽

Vol 36 (Part 1, No. 11) ◽

pp. 6900-6904 ◽

Cited By ~ 8

Author(s):

Yung-Hsin Chen ◽

Chen-Ti Hu ◽

I-Nan Lin

Keyword(s):

Chemical Vapor Deposition ◽

Silicon Nitride ◽

Vapor Deposition ◽

Microwave Plasma ◽

Diamond Films ◽

Chemical Vapor ◽

Silicon Substrates ◽

Deposition Technique ◽

Vapor Deposition Technique ◽

Area Deposition

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Nucleation effects and characteristics of diamond film grown by arc discharge plasma jet chemical vapor deposition

Thin Solid Films ◽

10.1016/0040-6090(92)90507-8 ◽

1992 ◽

Vol 212 (1-2) ◽

pp. 112-121 ◽

Cited By ~ 10

Author(s):

Naoto Ohtake ◽

Masanori Yoshikawa

Keyword(s):

Chemical Vapor Deposition ◽

Diamond Film ◽

Vapor Deposition ◽

Discharge Plasma ◽

Arc Discharge ◽

Chemical Vapor ◽

Plasma Jet

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Raman, photoluminescence and morphological studies of Si- and N-doped diamond films grown on Si(100) substrate by hot-filament chemical vapor deposition technique

Diamond and Related Materials ◽

10.1016/s0925-9635(01)00521-0 ◽

2002 ◽

Vol 11 (1) ◽

pp. 75-86 ◽

Cited By ~ 41

Author(s):

D.V. Musale ◽

S.R. Sainkar ◽

S.T. Kshirsagar

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Diamond Films ◽

Chemical Vapor ◽

Deposition Technique ◽

Chemical Vapor Deposition Technique ◽

Morphological Studies ◽

Vapor Deposition Technique ◽

Hot Filament

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Diamond Film Preparation by Arc Discharge Plasma Jet Chemical Vapor Deposition in the Methane Atmosphere

Journal of The Electrochemical Society ◽

10.1149/1.2086540 ◽

1990 ◽

Vol 137 (2) ◽

pp. 717-722 ◽

Cited By ~ 132

Author(s):

Naoto Ohtake ◽

Masanori Yoshikawa

Keyword(s):

Chemical Vapor Deposition ◽

Diamond Film ◽

Vapor Deposition ◽

Discharge Plasma ◽

Arc Discharge ◽

Chemical Vapor ◽

Plasma Jet ◽

Film Preparation

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