Electrical characterization of rapid thermal nitrided and reoxidized plasma‐enhanced chemical‐vapor‐deposited silicon dioxide metal‐oxide‐silicon structures

S. S. Ang; Y. J. Shi; W. D. Brown

doi:10.1063/1.357910

Electrical characterization of rapid thermal nitrided and reoxidized plasma‐enhanced chemical‐vapor‐deposited silicon dioxide metal‐oxide‐silicon structures

Journal of Applied Physics ◽

10.1063/1.357910 ◽

1994 ◽

Vol 76 (12) ◽

pp. 7985-7989 ◽

Cited By ~ 1

Author(s):

S. S. Ang ◽

Y. J. Shi ◽

W. D. Brown

Keyword(s):

Metal Oxide ◽

Silicon Dioxide ◽

Electrical Characterization ◽

Chemical Vapor ◽

Chemical Vapor Deposited ◽

Silicon Structures ◽

Metal Oxide Silicon

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Electrical characterization of low‐pressure chemical‐vapor‐deposited silicon dioxide metal‐oxide‐silicon structures

Journal of Applied Physics ◽

10.1063/1.353093 ◽

1993 ◽

Vol 73 (5) ◽

pp. 2397-2401 ◽

Cited By ~ 9

Author(s):

S. S. Ang ◽

Y. J. Shi ◽

W. D. Brown

Keyword(s):

Metal Oxide ◽

Silicon Dioxide ◽

Electrical Characterization ◽

Chemical Vapor ◽

Low Pressure ◽

Chemical Vapor Deposited ◽

Pressure Chemical ◽

Silicon Structures ◽

Metal Oxide Silicon

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Electrical characterization of rapid thermal nitrided and re‐oxidized low‐pressure chemical‐vapor‐deposited silicon dioxide metal–oxide–silicon structures

Journal of Applied Physics ◽

10.1063/1.361047 ◽

1996 ◽

Vol 79 (4) ◽

pp. 1968-1972 ◽

Cited By ~ 2

Author(s):

S. S. Ang ◽

Y. J. Shi ◽

W. D. Brown

Keyword(s):

Metal Oxide ◽

Silicon Dioxide ◽

Electrical Characterization ◽

Chemical Vapor ◽

Low Pressure ◽

Chemical Vapor Deposited ◽

Pressure Chemical ◽

Silicon Structures ◽

Metal Oxide Silicon

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The effects of gamma irradiation on low-pressure chemical-vapor-deposited silicon dioxide metal-oxide-silicon structures

Microelectronics Reliability ◽

10.1016/0026-2714(94)90015-9 ◽

1994 ◽

Vol 34 (5) ◽

pp. 909-919 ◽

Cited By ~ 3

Author(s):

S.S. Ang ◽

Y.J. Shi ◽

W.D. Brown ◽

L. West

Keyword(s):

Metal Oxide ◽

Silicon Dioxide ◽

Gamma Irradiation ◽

Chemical Vapor ◽

Low Pressure ◽

Chemical Vapor Deposited ◽

Pressure Chemical ◽

Silicon Structures ◽

Metal Oxide Silicon

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Electrical Characterization of Silicon Dioxide Thin Film Prepared by ArF Excimer Laser Chemical Vapor Deposition from Silicon Tetraacetate

Japanese Journal of Applied Physics ◽

10.1143/jjap.36.l150 ◽

1997 ◽

Vol 36 (Part 2, No. 2A) ◽

pp. L150-L153 ◽

Cited By ~ 2

Author(s):

Atsushi Maruyama ◽

Kazuhiro Nakata ◽

Ken Yukimura ◽

Toshiro Maruyama

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Silicon Dioxide ◽

Excimer Laser ◽

Vapor Deposition ◽

Electrical Characterization ◽

Chemical Vapor ◽

Laser Chemical Vapor Deposition ◽

Arf Excimer Laser

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Electrical Characterization of Silicon Dioxide Thin Films Prepared by Chemical Vapor Deposition from Tetrakis(diethylamino)silane and Ozone

Japanese Journal of Applied Physics ◽

10.1143/jjap.36.l922 ◽

1997 ◽

Vol 36 (Part 2, No. 7B) ◽

pp. L922-L925 ◽

Cited By ~ 1

Author(s):

Toshiro Maruyama

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Silicon Dioxide ◽

Vapor Deposition ◽

Electrical Characterization ◽

Chemical Vapor

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X‐ray diffraction study and electrical characterization of boron‐implanted low‐pressure chemical vapor deposited polycrystalline silicon layers

Journal of Applied Physics ◽

10.1063/1.333806 ◽

1984 ◽

Vol 56 (10) ◽

pp. 2751-2761 ◽

Cited By ~ 7

Author(s):

M. Hendriks ◽

R. Delhez ◽

Th. H. de Keijser ◽

S. Radelaar ◽

F. H. P. M. Habraken ◽

...

Keyword(s):

Diffraction Study ◽

Polycrystalline Silicon ◽

Electrical Characterization ◽

Chemical Vapor ◽

Low Pressure ◽

X Ray Diffraction ◽

X Ray ◽

Chemical Vapor Deposited ◽

Pressure Chemical

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Electrical characterization of silicon dioxide and silicon oxynitride thin films

10.31979/etd.dunk-3588 ◽

2006 ◽

Author(s):

April Tai

Keyword(s):

Thin Films ◽

Silicon Dioxide ◽

Electrical Characterization ◽

Silicon Oxynitride

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Suppression and characterization of interface states at low-pressure-chemical-vapor-deposited SiN /III-nitride heterostructures

Applied Surface Science ◽

10.1016/j.apsusc.2020.148530 ◽

2021 ◽

Vol 542 ◽

pp. 148530

Author(s):

Kexin Deng ◽

Xinhua Wang ◽

Sen Huang ◽

Haibo Yin ◽

Jie Fan ◽

...

Keyword(s):

Chemical Vapor ◽

Low Pressure ◽

Interface States ◽

Chemical Vapor Deposited ◽

Pressure Chemical

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Characterization of chlorinated chemical vapor deposited and natural (100) diamond

Surface Science ◽

10.1016/s0039-6028(99)00197-1 ◽

1999 ◽

Vol 425 (2-3) ◽

pp. 245-258 ◽

Cited By ~ 10

Author(s):

J.A. Chaney ◽

C.S. Feigerle

Keyword(s):

Chemical Vapor ◽

Chemical Vapor Deposited

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Characterization of Stacked Hafnium Oxide (HfO2)/Silicon Dioxide (SiO2) Metal-Oxide-Semiconductor (MOS) Tunneling Temperature Sensors

ECS Transactions ◽

10.1149/1.3206635 ◽

2019 ◽

Vol 25 (6) ◽

pp. 361-370

Author(s):

Chih-Yao Wang ◽

Jenn-Gwo Hwu

Keyword(s):

Metal Oxide ◽

Silicon Dioxide ◽

Hafnium Oxide ◽

Temperature Sensors ◽

Metal Oxide Semiconductor ◽

Oxide Semiconductor

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