X‐ray diffraction study and electrical characterization of boron‐implanted low‐pressure chemical vapor deposited polycrystalline silicon layers

1984 ◽  
Vol 56 (10) ◽  
pp. 2751-2761 ◽  
Author(s):  
M. Hendriks ◽  
R. Delhez ◽  
Th. H. de Keijser ◽  
S. Radelaar ◽  
F. H. P. M. Habraken ◽  
...  
Keyword(s):  
Diffraction Study ◽  
Polycrystalline Silicon ◽  
Electrical Characterization ◽  
Chemical Vapor ◽  
Low Pressure ◽  
X Ray Diffraction ◽  
X Ray ◽  
Chemical Vapor Deposited ◽  
Pressure Chemical

Characterization of Low Pressure Chemical Vapor Deposited Polysilicon Using Ellipsometry

1996 ◽  
Vol 51-52 ◽  
pp. 179-186 ◽  
Author(s):  
L. Asinovsky ◽  
S. Fox ◽  
E. Karagiannis ◽  
M. Schroth ◽  
J.J. Sweeney
Keyword(s):  
Chemical Vapor ◽  
Low Pressure ◽  
Chemical Vapor Deposited ◽  
Pressure Chemical

Lateral diffusion of arsenic in low pressure chemical vapor deposited polycrystalline silicon

1983 ◽  
Vol 42 (2) ◽  
pp. 171-172 ◽  
Author(s):  
N. Lewis ◽  
G. Gildenblat ◽  
M. Ghezzo ◽  
W. Katz ◽  
G. A. Smith
Keyword(s):  
Polycrystalline Silicon ◽  
Lateral Diffusion ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Chemical Vapor Deposited ◽  
Pressure Chemical
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