Experimental and theoretical study of the crystallization of chemical‐vapor‐deposited mixed‐phase silicon films

1994 ◽  
Vol 76 (2) ◽  
pp. 777-790 ◽  
Author(s):  
Apostolos T. Voutsas ◽  
Miltiadis K. Hatalis
Keyword(s):  
Theoretical Study ◽  
Chemical Vapor ◽  
Mixed Phase ◽  
Silicon Films ◽  
Chemical Vapor Deposited

Doping of phosphorus in chemical-vapor-deposited silicon carbide layers: A theoretical study

2005 ◽  
Vol 87 (21) ◽  
pp. 212114 ◽  
Author(s):  
T. Hornos ◽  
A. Gali ◽  
R. P. Devaty ◽  
W. J. Choyke
Keyword(s):  
Silicon Carbide ◽  
Theoretical Study ◽  
Chemical Vapor ◽  
Chemical Vapor Deposited

Characterization of Chemical-Vapor-Deposited Amorphous-Silicon Films

1993 ◽  
Vol 32 (Part 2, No.1A/B) ◽  
pp. L20-L23 ◽  
Author(s):  
Toshiaki Shiraiwa ◽  
Osamu Sugiura ◽  
Hiroshi Kanoh ◽  
Norihito Asai ◽  
Koh-ichi Usami ◽  
...  
Keyword(s):  
Amorphous Silicon ◽  
Chemical Vapor ◽  
Silicon Films ◽  
Chemical Vapor Deposited

Hydrogen-Radical Annealing of Chemical Vapor-Deposited Amorphous Silicon Films

1990 ◽  
Vol 29 (Part 2, No. 12) ◽  
pp. L2171-L2173 ◽  
Author(s):  
Yasutaka Uchida ◽  
Hiroshi Kanoh ◽  
Osamu Sugiura ◽  
Masakiyo Matsumura
Keyword(s):  
Amorphous Silicon ◽  
Chemical Vapor ◽  
Silicon Films ◽  
Chemical Vapor Deposited ◽  
Hydrogen Radical

Characterization of hydrogenation and dehydrogenation of post‐plasma treated low‐pressure chemical‐vapor‐deposited amorphous silicon films

1987 ◽  
Vol 62 (9) ◽  
pp. 3740-3746 ◽  
Author(s):  
Minoru Nakamura ◽  
Toshiyuki Ohno ◽  
Nobutake Konishi ◽  
Kenji Miyata ◽  
Norimasa Kamezawa
Keyword(s):  
Amorphous Silicon ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Silicon Films ◽  
Chemical Vapor Deposited ◽  
Pressure Chemical
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