scholarly journals Publisher's Note: “Kinetics following addition of sulfur fluorides to a weakly ionized plasma from 300 to 500 K: Rate constants and product determinations for ion–ion mutual neutralization and thermal electron attachment to SF5, SF3, and SF2” [J. Chem. Phys. 133, 234304 (2010)]

2011 ◽  
Vol 134 (6) ◽  
pp. 069901 ◽  
Author(s):  
Nicholas S. Shuman ◽  
Thomas M. Miller ◽  
Nilay Hazari ◽  
Eddie D. Luzik ◽  
A. A. Viggiano
2009 ◽  
Vol 80 (3) ◽  
pp. 034104 ◽  
Author(s):  
Thomas M. Miller ◽  
Jeffrey F. Friedman ◽  
John S. Williamson ◽  
Linda C. Schaffer ◽  
A. A. Viggiano

1988 ◽  
Vol 41 (9) ◽  
pp. 1491 ◽  
Author(s):  
J Sherwell ◽  
R Cooper ◽  
DC Nguyen ◽  
SP Mezyk

A new technique involving a combination of microwave absorption techniques and pulse radiolysis has been used to monitor electron processes in irradiated gases. The thermal electron attachment rate constants of various halogen-containing molecules have been measured and compared with the available literature values. The adaption of this technique for the measurement of electron-ion recombination rate constants and thermalization times for these gases is discussed.


1982 ◽  
Vol 86 (8) ◽  
pp. 1240-1242 ◽  
Author(s):  
Lucia M. Babcock ◽  
Gerald E. Streit

Sign in / Sign up

Export Citation Format

Share Document