Kinetics following addition of sulfur fluorides to a weakly ionized plasma from 300 to 500 K: Rate constants and product determinations for ion–ion mutual neutralization and thermal electron attachment to SF5, SF3, and SF2

2010 ◽  
Vol 133 (23) ◽  
pp. 234304 ◽  
Author(s):  
Nicholas S. Shuman ◽  
Thomas M. Miller ◽  
Nilay Hazari ◽  
Eddie D. Luzik ◽  
A. A. Viggiano
Keyword(s):  
Rate Constants ◽  
Electron Attachment ◽  
Thermal Electron ◽  
Weakly Ionized ◽  
Weakly Ionized Plasma

A new instrument for thermal electron attachment at high temperature: NF3 and CH3Cl attachment rate constants up to 1100 K

2009 ◽  
Vol 80 (3) ◽  
pp. 034104 ◽  
Author(s):  
Thomas M. Miller ◽  
Jeffrey F. Friedman ◽  
John S. Williamson ◽  
Linda C. Schaffer ◽  
A. A. Viggiano
Keyword(s):  
High Temperature ◽  
Rate Constants ◽  
Electron Attachment ◽  
Attachment Rate ◽  
Thermal Electron ◽  
New Instrument

Microwave Conductivity: A New Technique for Gas-Phase Pulse Radiolysis

1988 ◽  
Vol 41 (9) ◽  
pp. 1491 ◽  
Author(s):  
J Sherwell ◽  
R Cooper ◽  
DC Nguyen ◽  
SP Mezyk
Keyword(s):  
Gas Phase ◽  
Rate Constants ◽  
Recombination Rate ◽  
Pulse Radiolysis ◽  
Electron Attachment ◽  
New Technique ◽  
Attachment Rate ◽  
Thermal Electron ◽  
Ion Recombination ◽  
A New Technique

A new technique involving a combination of microwave absorption techniques and pulse radiolysis has been used to monitor electron processes in irradiated gases. The thermal electron attachment rate constants of various halogen-containing molecules have been measured and compared with the available literature values. The adaption of this technique for the measurement of electron-ion recombination rate constants and thermalization times for these gases is discussed.

Thermal electron attachment to sulfur tetrafluoride

1982 ◽  
Vol 86 (8) ◽  
pp. 1240-1242 ◽  
Author(s):  
Lucia M. Babcock ◽  
Gerald E. Streit
Keyword(s):  
Electron Attachment ◽  
Thermal Electron ◽  
Sulfur Tetrafluoride
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