A new instrument for thermal electron attachment at high temperature: NF3 and CH3Cl attachment rate constants up to 1100 K

2009 ◽  
Vol 80 (3) ◽  
pp. 034104 ◽  
Author(s):  
Thomas M. Miller ◽  
Jeffrey F. Friedman ◽  
John S. Williamson ◽  
Linda C. Schaffer ◽  
A. A. Viggiano
Keyword(s):  
High Temperature ◽  
Rate Constants ◽  
Electron Attachment ◽  
Attachment Rate ◽  
Thermal Electron ◽  
New Instrument

Microwave Conductivity: A New Technique for Gas-Phase Pulse Radiolysis

1988 ◽  
Vol 41 (9) ◽  
pp. 1491 ◽  
Author(s):  
J Sherwell ◽  
R Cooper ◽  
DC Nguyen ◽  
SP Mezyk
Keyword(s):  
Gas Phase ◽  
Rate Constants ◽  
Recombination Rate ◽  
Pulse Radiolysis ◽  
Electron Attachment ◽  
New Technique ◽  
Attachment Rate ◽  
Thermal Electron ◽  
Ion Recombination ◽  
A New Technique

A new technique involving a combination of microwave absorption techniques and pulse radiolysis has been used to monitor electron processes in irradiated gases. The thermal electron attachment rate constants of various halogen-containing molecules have been measured and compared with the available literature values. The adaption of this technique for the measurement of electron-ion recombination rate constants and thermalization times for these gases is discussed.

Electron attachment to halomethanes at high temperature: CH2Cl2, CF2Cl2, CH3Cl, and CF3Cl attachment rate constants up to 1100 K

2009 ◽  
Vol 131 (8) ◽  
pp. 084302 ◽  
Author(s):  
Thomas M. Miller ◽  
Jeffrey F. Friedman ◽  
Linda C. Schaffer ◽  
A. A. Viggiano
Keyword(s):  
High Temperature ◽  
Rate Constants ◽  
Electron Attachment ◽  
Attachment Rate

Measurements of thermal electron attachment rate coefficients to molecules using an electron swarm technique

2005 ◽  
Vol 35 (2) ◽  
pp. 307-312 ◽  
Author(s):  
C. A. Mayhew ◽  
A. D.J. Critchley ◽  
D. C. Howse ◽  
V. Mikhailov ◽  
M. A. Parkes
Keyword(s):  
Electron Attachment ◽  
Rate Coefficients ◽  
Attachment Rate ◽  
Thermal Electron

scholarly journals Thermal Electron Attachment to SF6 and CFCl3

1983 ◽  
Vol 36 (1) ◽  
pp. 15 ◽  
Author(s):  
RW Crompton ◽  
GN Haddad
Keyword(s):  
Electron Density ◽  
Electron Attachment ◽  
Sampling Technique ◽  
Gas Mixtures ◽  
Single Source ◽  
Attachment Rate ◽  
Thermal Electron ◽  
Source Of Error

Measurements of the attachment rate for thermal electrons to SF6 and CFCI3 have been made using the Cavalieri electron-density sampling technique. The largest single source of error was shown to be uncertainty in the composition of the gas mixtures used in the experiments which contained < 10 ppm of the attaching gases. By paying special attention to this problem, the overall uncertainty in the attachment rates was reduced to less than � 3 %.

Electron attachment rate constants of SOCl2 in Ar, N2, and CH4

1986 ◽  
Vol 85 (11) ◽  
pp. 6470-6474 ◽  
Author(s):  
W. C. Wang ◽  
L. C. Lee
Keyword(s):  
Rate Constants ◽  
Electron Attachment ◽  
Attachment Rate
Sign in / Sign up

Export Citation Format

Share Document