Study of charge trapping instabilities in a silicon‐nitride/indium‐phosphide metal‐insulator‐semiconductor structure by the constant‐capacitance method
2014 ◽
Vol 169
(9)
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pp. 791-799
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2008 ◽
Vol 108
(10)
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pp. 1215-1219
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Keyword(s):
1987 ◽
Vol 64
(4)
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pp. 411-416
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