Mechanistic studies of dielectric thin film growth by low pressure chemical vapor deposition: The reaction of tetraethoxysilane with SiO2surfaces
2002 ◽
Vol 406
(1-2)
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pp. 215-218
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1990 ◽
Vol 8
(3)
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pp. 1864-1870
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1995 ◽
Vol 147
(1-2)
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pp. 130-146
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2012 ◽
Vol 89
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pp. 109-115
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1992 ◽
Vol 39
(3)
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pp. 598-606
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1997 ◽
Vol 144
(4)
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pp. 1423-1429
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