Mechanistic studies of dielectric thin film growth by low pressure chemical vapor deposition: The reaction of tetraethoxysilane with SiO2surfaces

1991 ◽  
Vol 69 (10) ◽  
pp. 7037-7049 ◽  
Author(s):  
Laura L. Tedder ◽  
Guangquan Lu ◽  
John E. Crowell
2002 ◽  
Vol 406 (1-2) ◽  
pp. 215-218 ◽  
Author(s):  
Yoshio Ohshita ◽  
Atsushi Ogura ◽  
Asako Hoshino ◽  
Shigeki Hiiro ◽  
Toshie Suzuki ◽  
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1990 ◽  
Vol 8 (3) ◽  
pp. 1864-1870 ◽  
Author(s):  
John E. Crowell ◽  
Laura L. Tedder ◽  
Hee‐Chuen Cho ◽  
Frank M. Cascarano ◽  
Mark A. Logan

2012 ◽  
Vol 89 ◽  
pp. 109-115 ◽  
Author(s):  
Jong Mun Choi ◽  
Dohan Lee ◽  
Ji Hun Park ◽  
Chang Gyoun Kim ◽  
Taek-Mo Chung ◽  
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1997 ◽  
Vol 144 (4) ◽  
pp. 1423-1429 ◽  
Author(s):  
Zhiguo Meng ◽  
Zhonghe Jin ◽  
Bhat A. Gururaj ◽  
Paul Chu ◽  
Hoi S. Kwok ◽  
...  

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