Uniform β‐SiC thin‐film growth on Si by low pressure rapid thermal chemical vapor deposition

1992 ◽  
Vol 60 (17) ◽  
pp. 2107-2109 ◽  
Author(s):  
A. J. Steckl ◽  
J. P. Li
Keyword(s):  
Thin Film ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Film Growth ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Thin Film Growth ◽  
Thermal Chemical Vapor Deposition

Using tetrakis-diethylamido-hafnium for HfO2 thin-film growth in low-pressure chemical vapor deposition

2002 ◽  
Vol 406 (1-2) ◽  
pp. 215-218 ◽  
Author(s):  
Yoshio Ohshita ◽  
Atsushi Ogura ◽  
Asako Hoshino ◽  
Shigeki Hiiro ◽  
Toshie Suzuki ◽  
...  
Keyword(s):  
Thin Film ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Film Growth ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Thin Film Growth ◽  
Pressure Chemical

Effect of hydrogen atmosphere in Cu thin film growth by chemical vapor deposition using Cu(dmamb)2

2012 ◽  
Vol 89 ◽  
pp. 109-115 ◽  
Author(s):  
Jong Mun Choi ◽  
Dohan Lee ◽  
Ji Hun Park ◽  
Chang Gyoun Kim ◽  
Taek-Mo Chung ◽  
...  
Keyword(s):  
Thin Film ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Film Growth ◽  
Chemical Vapor ◽  
Hydrogen Atmosphere ◽  
Thin Film Growth ◽  
Cu Thin Film

Model studies of dielectric thin film growth: Chemical vapor deposition of SiO2

1990 ◽  
Vol 8 (3) ◽  
pp. 1864-1870 ◽  
Author(s):  
John E. Crowell ◽  
Laura L. Tedder ◽  
Hee‐Chuen Cho ◽  
Frank M. Cascarano ◽  
Mark A. Logan
Keyword(s):  
Thin Film ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Film Growth ◽  
Chemical Vapor ◽  
Thin Film Growth ◽  
Dielectric Thin Film ◽  
Model Studies
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